Color filter and light-emitting display element
一种发光显示、滤色器的技术,应用在光学元件、电气元件、偏振元件等方向,能够解决减少发光元件光使用效率等问题,达到防止光使用率的降低的效果
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Embodiment 1
[0605]
[0606] "Manufacture of RGBW color filter 1"
[0607] On a glass substrate for manufacturing a color filter, black resist CK-8400 (product of FUJIFILM Electronic Materials Co., Ltd.) was applied to have a thickness of 1.0 μm (after drying) by a spin coater, and then heated at 120° C. Dry under the same conditions for 2 minutes, thereby forming a uniform black coating film.
[0608] Then, using an exposure device, use light with a wavelength of 365nm at 300mJ / cm 2 The obtained coated film was irradiated through a mask 100 μm thick under exposure dose. After the irradiation, the exposed film was developed at 26° C. for 90 sec with a developer of 10% CD-1 (product of FUJIFILM Electronic Materials Co., Ltd.). Next, the developed film was rinsed with running water for 20 sec, dried with an air knife, and heat-treated at 220° C. for 60 min, thereby forming a 96 ppi black matrix pattern (image).
[0609] Then, the following three-color curable composition was dispersed w...
Embodiment 2
[0679]
[0680] In the manufacture of the color filter of Embodiment 1, the RGB pixels are formed on a glass substrate (for manufacturing the color filter) with a retardation film (1 / 4λ retardation film: 27344K, a product of Edmont Optics, Japan), A UV-ray curable adhesive (XNR5516HV, product of Nagase-Chiba Co., Ltd.) was attached to the retardation film instead of being formed on a glass substrate for manufacturing a color filter.
[0681] A black matrix pattern was formed on the retardation film in the same manner as in Example 1, and then a photo-alignment layer and a polarizing layer were formed as follows. After that, similarly to Example 1, green, red, and blue pattern images were formed to manufacture the color filter 2 of Example 2 having a flat surface.
[0682] Then, in the same manner as in Example 1, the light-emitting display element of Example 2 was formed using the color filter 2 of Example 2 and the organic EL element of Example 1.
[0683]
[0684] [Prep...
Embodiment 3
[0710]
[0711] (1) Form a 100nm-thick patterned aluminum (Al) layer (used as a reflective light layer) pattern on a glass substrate with TFTs corresponding to R, G, B and W sub-pixels through a vacuum film.
[0712] (2) By ion plating, SiON is laminated on the reflective layer of R, G, B and W sub-pixels (i.e. 120nm in R sub-pixel, 70nm in G sub-pixel, 30nm in B sub-pixel, and 2200nm in W sub-pixel ), thereby forming an optical path length adjustment layer of a transparent insulating material.
[0713] (3) A transparent electrode (ITO, thickness: 60 nm) was formed by patterning in the optical path length adjustment layer of the sub-pixel. Each transparent electrode is electrically connected to the TFT electrode through the connection hole provided in the optical path length adjustment layer and the reflective layer.
[0714] (4) The light-emitting part is covered with a metal cover, and the non-light-emitting part is covered with an insulating layer.
[0715](5) By vacuum...
PUM
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Abstract
Description
Claims
Application Information
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