Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Radiation sensitivity resin composition for display element, interlayer insulation film, protective film and spacer and forming method thereof

A technology of resin composition and display element, which is applied in the field of protective film, spacer, and interlayer insulating film, can solve the problems of heating, inability to solve the problem of low linear expansion of cured film, improvement of voltage holding ratio, inability to form fine pattern, etc. Achieving the effect of high radiation sensitivity

Inactive Publication Date: 2011-11-09
JSR CORPORATIOON
View PDF11 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the coating liquid containing a polyimide precursor in the above-mentioned document is a chemical curing system, and has no image forming ability of exposure and development, so fine patterns cannot be formed.
In addition, when forming an insulating film using a coating solution containing such a polyimide precursor, there is a problem that it takes more than 1 hour to heat and burn the cured film, and it is impossible to solve the problem of low linear expansion of the cured film and improvement Various practical issues such as voltage retention

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radiation sensitivity resin composition for display element, interlayer insulation film, protective film and spacer and forming method thereof
  • Radiation sensitivity resin composition for display element, interlayer insulation film, protective film and spacer and forming method thereof
  • Radiation sensitivity resin composition for display element, interlayer insulation film, protective film and spacer and forming method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0121]

[0122]The radiation-sensitive resin composition of the present invention can be prepared by adding the above-mentioned (A) polymer, (B) ethylenically unsaturated compound, (C) radiation-sensitive polymerization initiator and (D) compound, and other components optionally added above. Mix well to prepare. This radiation-sensitive resin composition is preferably used in a solution state by being dissolved in an appropriate solvent. For example, by combining (A) polymer, (B) polymerizable unsaturated compound, (C) radiation-sensitive polymerization initiator, (D) compound, and optionally added (E) epoxy resin having two or more in one molecule Ethyl compound, (F) Adhesion aid, (G) Surfactant, (H) Storage stabilizer, (I) Heat resistance improver are mixed in a solvent at a predetermined ratio to prepare a solution state radiation-sensitive resin composition.

[0123] As the solvent used in the preparation of the radiation-sensitive resin composition of the present inve...

Embodiment

[0165] Hereinafter, synthesis examples and examples are shown to describe the present invention more specifically, but the present invention is not limited to these synthesis examples and examples.

[0166]

Synthetic example 1

[0168] In a flask with a condenser tube and a stirrer, add 5 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 220 parts by mass of diethylene glycol methyl ethyl ether, and then Add 20 parts by mass of styrene, 12 parts by mass of methacrylic acid, 28 parts by mass of methacrylic acid tricyclic [5.2.1.0 2,6 ]decyl-8-yl ester and 40 parts by mass of glycidyl methacrylate, nitrogen replacement, while slowly stirring, the temperature of the solution was raised to 70°C, and the temperature was kept for 5 hours to polymerize, to obtain a copolymer containing ( A-1) solution. The solid content concentration (ratio of the polymer mass to the total mass of the polymer solution) of the obtained polymer solution was 31.3%, and the weight average molecular weight Mw of the copolymer (A-1) was 12,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a radiation sensitivity resin composition for a display element, an interlayer insulation film, a protective film and a spacer and a forming method thereof. The radiation sensitivity resin composition can be heated and burned under low temperature in a short time, and has quite a high radiation sensitivity, displays low linear expansion coefficient, and is suitable for the spacer, the protective film and the interlayer insulation film, forming a flexible display. . The radiation sensitivity resin composition for a display element comprises a copolymer (A) having a constitutional unit with carboxyl (a1) and a constitutional unit with epoxy radical (a2), a polymerized compound (B) having vinyl unsaturated bond, a radiation sensitivity polymerized initiator (C), at least one selected from compounds expressed in a formula (1) and a formula (2).

Description

technical field [0001] The present invention relates to a radiation-sensitive resin composition for display elements, an interlayer insulating film, a protective film, and a spacer, and methods for forming them. In more detail, the present invention relates to an interlayer insulating film, a protective film, and a spacer that can be formed in a display element, particularly in a liquid crystal display element (LCD) and a charge-coupled device, by a radiation-sensitive resin composition; An interlayer insulating film, a protective film, and a spacer formed from the composition, and methods for forming them. Background technique [0002] In electronic components such as thin film transistor (hereinafter referred to as "TFT") liquid crystal display elements, magnetic head elements, integrated circuit elements, and image sensors, an interlayer insulating film is generally provided to insulate interconnections arranged in layers. Among the above-mentioned electronic components,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004G03F7/00G02F1/1333
CPCG03F7/0275H01L21/0273H01L21/0274
Inventor 米田英司西信弘儿玉诚一郎猪俣克巳
Owner JSR CORPORATIOON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products