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Method for removing moisture in hydrogen chloride gas

A hydrogen chloride gas, hydrogen chloride technology, applied in separation methods, chlorine/hydrogen chloride, chlorine/hydrogen chloride purification and other directions, can solve problems such as difficult removal, and achieve the effects of large energy consumption, high removal efficiency, and low treatment costs.

Inactive Publication Date: 2011-08-17
HEBEI XINGKUANG SILICON TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of this invention is to provide a method for removing moisture in hydrogen chloride gas, which solves the problem of removing trace water contained in raw hydrogen chloride in the production process

Method used

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Examples

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Embodiment 1

[0012] A chemical plant has an annual output of 20,000 tons of trichlorosilane, and hydrogen chloride gas, the raw material for the synthesis of trichlorosilane, is produced by hydrochloric acid deep analysis process. The analyzed hydrogen chloride has a water content of 400-800ppm after cryogenic separation. Adopt the present invention to process: the hydrogen chloride containing 400-800ppm moisture after cryogenic separation is passed into the bubble-cap drying tower from the bottom of the bubble-cap drying tower, and the mass fraction of entering from the top of the bubble-cap drying tower through pump circulation is 99.9% Silicon tetrachloride is contacted in countercurrent, and the gas flowing out of the top of the tower is filtered by a metal sintered filter element filter to obtain hydrogen chloride gas with a moisture content of less than 6ppm, and the silicon tetrachloride liquid flowing out from the bottom of the tower is pumped to the bubble tower The top loop is us...

Embodiment 2

[0014] A chemical plant synthesizes trichlorosilane, and the hydrogen chloride gas used is the by-product hydrogen chloride gas produced by the potassium sulfate plant. Adopt the present invention to process: the hydrochloric acid by-product of producing potassium sulfate device removes impurity oxygen, nitrogen, carbon dioxide contained therein through pressure swing adsorption and contains water 1800ppm, it is passed into bubble cap drying tower bottom from bubble cap drying tower, mass The silicon tetrachloride liquid with a fraction of 99.9% is introduced from the top of the bubble-cap drying tower. In the tower, hydrogen chloride and silicon tetrachloride are in countercurrent contact. The hydrogen chloride gas that meets the requirements is less than 8ppm, and the silicon tetrachloride liquid flowing out from the bottom of the tower is pumped to the top of the bubble column for recycling through a circulation pump.

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Abstract

The invention discloses a method for removing moisture in a hydrogen chloride gas, which comprises the following steps of: introducing the hydrogen chloride gas containing moisture into a bubble-cap drying tower from the bottom of the bubble-cap drying tower, and introducing a silicon tetrachloride liquid from the top of the bubble-cap drying tower so that the silicon tetrachloride liquid and the hydrogen chloride gas are in countercurrent contact in the bubble-cap drying tower; filtering solid dust from the hydrogen chloride gas flowing out from the top of the tower through a filter so as to obtain dry hydrogen chloride with moisture being less than 10 ppm; and pumping the silicon tetrachloride liquid flowing out from the bottom of the tower to the top of the bubble-cap drying tower for recycle use through a circulating pump. Compared with the currently used cryogenic dewatering method and concentrated sulfuric acid dewatering method, the method provided by the invention has higher removal efficiency, and the moisture content of the hydrogen chloride product is less than 10 ppm. The method has a simple process and low treatment expense and is applicable to industrial application.

Description

technical field [0001] The invention relates to a method for removing moisture in hydrogen chloride gas, belonging to the technical field of inorganic chemistry. Background technique [0002] In the production of trichlorosilane and PVC, there are strict requirements on the moisture contained in the hydrogen chloride gas used as raw materials, and the moisture content is generally required to be less than 50ppm. There are two main methods for hydrogen chloride dehydration disclosed in the prior art: one is to use cryogenic separation, that is, use -35°C frozen brine to cool the hydrogen chloride containing water, so that the water in it can be condensed and separated; the other is to use concentrated sulfuric acid Dehydration means that hydrogen chloride and concentrated sulfuric acid are countercurrently absorbed in the absorption tower to separate the water. In the cryogenic separation process, the moisture in the obtained hydrogen chloride is 300-800ppm, which cannot mee...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/07B01D53/78B01D53/46
Inventor 孟祥考谷文军胡永琪吴军祥
Owner HEBEI XINGKUANG SILICON TECH
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