Method for adjusting real-time monitor device in exposure path of concave holographic grating
A holographic grating and real-time monitoring technology, which is applied in photoplate-making process exposure devices, microlithography exposure equipment, diffraction gratings, etc. The effect of misalignment of light, improving the production level
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[0011] The present invention is implemented according to three method steps of step 1, step 2 and step 3 established in the technical solution to be solved. Among them, the light source laser 1 adopts Kr + Laser, the emission wavelength is 413.1nm; the first plane mirror 2, the second plane mirror 4 and the third plane mirror 5 are aluminum-plated mirrors on glass substrates; the beam splitter 3 adopts double-glued glass prisms; 6 and the second spatial filter 7 are composed of a microscope objective lens and a pinhole; the grating substrate 9 and the holographic grating 10 are made of K9 optical glass, and the photoresist coated on the K9 optical glass is Japanese Shipley 1805 positive photoresist etchant; the receiving screen 11 is made of white frosted glass; the monitoring laser 12 is a He-Ne laser with an emission wavelength of 632.8nm; the photodetector 13 is a photomultiplier tube.
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