Method for preparing ZnO nanowire suspended back gate field-effect transistor
A technology of field effect tubes and nanowires, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as no breakthrough results, and achieve the effects of simple process, high performance, and cost saving
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[0033] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0034] The core idea of the present invention is: first prepare a highly doped P++ substrate, and evaporate a layer on the front side of the highly doped P++ substrate SiO 2 Form gate oxide, use HF to remove the oxide layer on the back of the highly doped P++ substrate, and form the gate with gold on the back; then photolithographically evaporate the source and drain metal on the gate oxide Electrodes, the ZnO nanowires are peeled off from the intrinsic glass substrate by the method of ethanol hydrolysis and ultrasound, and a single nanowire is randomly dropped onto the P-type Si substrate for positioning, so that the two ends of the nanowire overlap with the source and drain electrodes of the device , using ZnO nano...
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