Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for forming carbon nanotube film, film-forming apparatus, and carbon nanotube film

A technology of carbon nanotubes and film-forming methods, which is applied in nanotechnology, nanotechnology, chemical instruments and methods, etc., can solve problems such as high heat resistance, non-heat-resistant substrates, and inability to apply polymer materials to achieve optical properties homogeneous effect

Inactive Publication Date: 2010-05-12
NAT INST OF ADVANCED IND SCI & TECH
View PDF7 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0021] On the other hand, even if it is a dry method, the method described in Non-Patent Document 5 also has the following problem: due to the formation reaction of single-walled carbon nanotubes The temperature is generally greater than or equal to 500°C, so the substrates that can be used are limited to substrates with high heat resistance, and substrates made of polymer materials and inorganic materials that are not heat-resistant cannot be used.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for forming carbon nanotube film, film-forming apparatus, and carbon nanotube film
  • Method for forming carbon nanotube film, film-forming apparatus, and carbon nanotube film
  • Method for forming carbon nanotube film, film-forming apparatus, and carbon nanotube film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0078] Hereinafter, embodiments of the present invention will be described in detail based on the drawings. In addition, the following examples are for making the invention of this application easier to understand, but are not limited to these examples. That is, modifications, implementation aspects, and other examples based on the technical idea of ​​the invention of this application are also included in the invention of this application.

[0079] figure 1 It is a front view for explaining the entire single-walled carbon nanotube thin film manufacturing apparatus of the embodiment of the present invention, and the main part is shown in cross section.

[0080] In this manufacturing device, the part for synthesizing single-walled carbon nanotubes 11 includes an electric furnace 1, a mullite reaction tube 2, a spray nozzle 3, a microfeeder 4, a second carbon source 5, a carrier gas source 6, The second carbon source flow meter 7, the first carrier gas flow meter 8, the second carrie...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
contact angleaaaaaaaaaa
Login to View More

Abstract

Disclosed are a method and an apparatus for efficiently mass-producing a single-walled carbon nanotube film, which is useful as a industrial material, at low temperature and low cost. The method and apparatus are characterized in that a carbon nanotube is synthesized from a raw material source by a fluidized CVD process, and the thus-synthesized carbon nanotube is caused to directly adhere to a substrate in a chamber connected with the reaction tube, thereby forming a carbon nanotube film on the substrate.

Description

Technical field [0001] The present invention relates to a method for forming a carbon nanotube film containing single-wall carbon nanotubes, a film forming device, and a carbon nanotube film. In more detail, the present invention relates to a method at 200 degrees or At low temperatures below 200 degrees Celsius, a method for mass- and low-cost production of carbon nanotubes formed from raw material sources, film-forming equipment, and thin films using the Flow Vapor Deposition (Chemical Vapor Deposition, CVD) method . Background technique [0002] Nanotubes are tubular molecules formed using a network of chemical bonds, and a representative one is Carbon Nanotube (CNT) in which graphite carbon is formed into a tubular network structure. When CNT was first produced in 1991, it was a multiwall carbon nanotube (MWCNT) with multiple walls, and in 1993, a single wall carbon nanotube (SWCNT) was produced. After that, it was also reported that BNC nanotubes and BN nanotubes in which ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01B31/02
CPCC01B31/024B82Y30/00B82Y40/00C01B32/164
Inventor 斎藤毅
Owner NAT INST OF ADVANCED IND SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products