Active etherate of pyrogallol and divinyl benzene polycondensate resin and synthesizing method thereof

Abstract

The invention discloses an active etherate of pyrogallol and divinyl benzene polycondensate resin, which belongs to the technical field of preparation of high polymer materials and a synthesizing method thereof. The active etherate is synthesized by pyrogallol and divinyl benzene polycondensate resin, etherification reagent and catalyst, and the etherification rate is controlled between 30 percent and 100 percent. The active etherate of the pyrogallol and divinyl benzene polycondensate resin has high photosensitization activity and can be used for aspects such as a traditional PS plate, a thermal sensitive CTP plate, photoresist, an electron beam anticorrosive agent or a chemical amplification anticorrosive agent, and the like. Compared with the prior art, the pyrogallol and divinyl benzene polycondensate resin is directly etherified under the action of the catalyst without esterification in advance, and the invention has high etherification rate, more excellent comprehensive performance, solid product, high stability and convenient storage.

Description

technical field [0001] The invention belongs to the technical field of polymer material preparation, and in particular relates to an active ether compound of pyrogallol and divinylbenzene polycondensation resin and a synthesis method thereof. Background technique [0002] In the invention patent (USP618212 (1990)) published by 3M Company in 1990, they used diphenylacetic acid and chloromethyl methyl ether, vinyl ethyl ether, dihydropyran, dihydrofuran and other active alkenes. Addition gives diphenyl acetate. This kind of ester is mixed with an acid generator, novolac resin and additives in a certain proportion, dissolved with an appropriate solvent, coated and dried, and the obtained resist coating will generate protonic acid in the exposed part after ultraviolet exposure, and it will be cured at room temperature. It can decompose the active ester of diphenylacetic acid, so that it can be developed with alkaline water to obtain an image, which can be used to make a positiv...

AI Technical Summary

Problems solved by technology

However, the invention of 3M Company has two serious problems: ① The compound has poor stability and is stored at room temperature, especially when it encounters light and moisture, it will quickly decompose by itself, making it difficult to preserve

②This compound is a liquid with extremely low viscosity, and the strength of the film layer will decrease when it is added to the photosensitive composition of the CTP plate, which will seriously affect the printing resistance

However, the etherified precursor in this technology is a single compound, so that the etherified ester and ether compounds are basically viscous, which is inconvenient to store and use.

When this compound is added to the photosensitive composition of the CTP plate, the strength of the film layer will decrease, which will affect the printing resistance and the layout of the plate.