Zinc oxide-based homogeneous structure transparent rram components and manufacturing method
A homogeneous structure, zinc oxide-based technology, applied in the direction of electrical components, vacuum evaporation plating, coating, etc., to achieve the effect of small lattice mismatch and good matching
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[0023] The substantive features and remarkable progress of the present invention will be further described below through the elaboration of specific embodiments.
[0024] Al-doped ZnO film (AZO) is selected as the electrode layer, and the general molecular formula is Al x Zn 1-x O, (0.02-4 ~9×10 -4 Ohm cm; Mg-doped ZnO thin film (MZO) is selected as the resistive layer, and the molecular formula is Mg y Zn 1-y O, (0.13 times. A zinc oxide-based homogeneous structure transparent RRAM component constructed from the electrode layer and the resistive switch layer is characterized in that the bottom electrode layer AZO (2) is sequentially deposited on the substrate (1), and the middle resister Variable layer MZO (3), top electrode AZO (4). Made by pulsed laser deposition (PLD), the specific process steps are as follows:
[0025] 1) The substrate is made of quartz glass (1), which is ultrasonically cleaned with acetone, ethanol and deionized water;
[0026] 2) Using a ZnO cer...
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