Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Zinc oxide-based homogeneous structure transparent rram components and manufacturing method

A homogeneous structure, zinc oxide-based technology, applied in the direction of electrical components, vacuum evaporation plating, coating, etc., to achieve the effect of small lattice mismatch and good matching

Inactive Publication Date: 2011-12-14
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In terms of research on transparent RRAM memory cells, so far, zinc oxide-based homogeneous structure RRAM memory cells have rarely been reported in various literatures at home and abroad.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Zinc oxide-based homogeneous structure transparent rram components and manufacturing method
  • Zinc oxide-based homogeneous structure transparent rram components and manufacturing method
  • Zinc oxide-based homogeneous structure transparent rram components and manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The substantive features and remarkable progress of the present invention will be further described below through the elaboration of specific embodiments.

[0024] Al-doped ZnO film (AZO) is selected as the electrode layer, and the general molecular formula is Al x Zn 1-x O, (0.02-4 ~9×10 -4 Ohm cm; Mg-doped ZnO thin film (MZO) is selected as the resistive layer, and the molecular formula is Mg y Zn 1-y O, (0.13 times. A zinc oxide-based homogeneous structure transparent RRAM component constructed from the electrode layer and the resistive switch layer is characterized in that the bottom electrode layer AZO (2) is sequentially deposited on the substrate (1), and the middle resister Variable layer MZO (3), top electrode AZO (4). Made by pulsed laser deposition (PLD), the specific process steps are as follows:

[0025] 1) The substrate is made of quartz glass (1), which is ultrasonically cleaned with acetone, ethanol and deionized water;

[0026] 2) Using a ZnO cer...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
electrical resistivityaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a zinc oxide-based homogeneous structure transparent resistive random access memory (RRAM) component and a manufacturing method. The storage element is composed of a sandwich structure of "electrode layer / resistance variable oxide layer / electrode layer" prepared in sequence on a quartz glass substrate. Wherein, the material of the electrode layer is a ZnO-based doped transparent conductive film, and the material of the resistive switch oxide layer is ZnO or a ZnO-based doped resistive thin film. On the premise of maintaining the transparency of the material, by adjusting the components of the ZnO-based thin film, the conductivity and resistance transition performance of the thin film material are controlled, so as to achieve the purpose of stable storage. The biggest advantage of the memory cell structure of the present invention is that it is based on low-cost zinc oxide-based homogeneous structure film materials, and a homogeneous RRAM memory cell structure with stable performance and good transparency is obtained through doping control, which is beneficial to RRAM memory devices Develop towards low-cost, high-performance transparent devices.

Description

technical field [0001] The invention relates to a transparent RRAM (resistive random access memory) component with a zinc oxide-based homogeneous structure and a manufacturing method. The invention discloses a transparent sandwich structure RRAM component and a manufacturing method thereof, belonging to the field of transparent electronic devices. Background technique [0002] In recent years, due to its simple structure and excellent compatibility with modern semiconductor CMOS processes, RRAM has gradually become a research hotspot for the new generation of non-volatile memory. In the research process of RRAM materials, people have gradually discovered that a variety of material systems have application potential as RRAM. It mainly includes: rare earth manganese oxide materials, transition metal perovskite structure materials, binary transition metal oxide materials, organic polymer semiconductor materials and some sulfide materials. At present, the research on binary tr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L45/00C23C14/28C23C14/08
Inventor 李效民曹逊于伟东杨长张亦文刘新军杨蕊
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products