Device for treating volatile organic gaseous contamination

Abstract

The invention relates to a device for the treatment of the pollution caused by a volatile organic gas, which comprises a washing tower, a catalytic oxidation tank, a liquid storage tank and an ozone generator, wherein the middle part of the space in the washing tower is provided with a plurality of washing solution nozzles, the lower part of the space in the washing tower is provided with a plurality of layers of sieve plates, the upper part of the space in the washing tower is provided with a gas-liquid separator, an air inlet of the washing tower is connected with the space on the lower part the sieve plates in the tower, and the air outlet is connected with the air outlet end of the gas-liquid separator; the catalytic oxidation tank is filled with photocatalyst particles, the air inlet of the catalytic oxidation tank is positioned on the bottom thereof, and the air outlet is positioned on the top thereof; the ozone generator is provided with an ozone contact device for dissolving the ozone into water; a nozzle pipeline of the washing tower is connected with the water storage tank; and a bottom water outlet and the water inlet on the bottom of the catalytic oxidation tank are connected with the liquid storage tank. The device has the advantages of good washing effect, less residue of volatile gas molecules in the gas, little washing solution carried by the discharged gas, fast oxidization rate, high ozone effective utilization rate, low cost for investment and running, less pollution in the washing solution, and less circulating use of water, and is applicable to the treatment of various gas pollutants which can be dissolved in water.

Description

technical field [0001] The invention relates to a treatment device for volatile organic gas pollution, which is mainly suitable for the purification treatment of waste gas generated in semiconductor production, and belongs to the field of environmental protection. Background technique [0002] During the semiconductor production process, the waste gas generated contains a large amount of volatile organic gases, which pollute the atmospheric environment, such as isopropanol, acetone, methyl ethyl ketone, and some high-boiling substances (such as the main component of photoresist), etc. At present, the method of concentrating and incinerating waste gas by rotary wheel, activated carbon adsorption and wet scrubbing are usually used to treat this column of waste gas. Among them, the concentrating and incinerating technology of rotary wheel consumes a lot of fuel, and the technology of activated carbon adsorption requires frequent replacement of activated carbon. The operating cos...

AI Technical Summary

Problems solved by technology

This wet scrubbing technology dissolves the oxidizing agent in the washing water, and oxidizes and washes at the same time. When the oxidizing agent is too much, the oxidizing agent will remain in the exhaust gas, and the contact time between the oxidizing agent and the pollutant is short, and the treatment efficiency is reduced. The oxidizing agent selected is as follows: There are many kinds, and the one with higher efficiency is ozone. Because the purpose of ozone is mainly used for disinfection or removal of some organic matter in water and wastewater treatment before treatment as subsequent treatment equipment, its organic matter treatment efficiency does not need to be very high, and simple Single reaction tank design, but when used for organic matter treatment, the efficiency of the existing reaction tank is relatively low

Someone once proposed a treatment equipment composed of an oxidation treatment unit, a reflux unit and an oxidation tank, which improved the treatment effect to a certain extent, but its system structure is relatively complicated, and the treatment efficiency needs to be further improved.

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