Manufacturing method for mask read only memory device
A manufacturing method, mask read-only technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., to achieve the effect of reducing process complexity, avoiding mixed use of machines, and avoiding logic process incompatibility problems
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0029] In order to make the technical features of the present invention more comprehensible, the present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0030] Please refer to figure 1 , which is a schematic flow chart of a mask ROM manufacturing method provided by an embodiment of the present invention. As shown in the figure, the manufacturing method of the mask ROM includes the following steps:
[0031] S1: Provide a semiconductor substrate defined with a memory cell area and a peripheral circuit area;
[0032] S2: forming an undoped gate substance layer on the semiconductor substrate;
[0033] S3: Etching the gate material layer to form a gate with a desired shape;
[0034] S4: sequentially forming a first silicon oxide layer and a silicon nitride layer on the semiconductor substrate;
[0035] S5: filling the medium layer in the storage unit area;
[0036] S6: forming a second silicon oxide layer on the semico...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com