Infrared-ultraviolet multi-color detector and production process thereof
A detector and ultraviolet technology, applied in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as unfavorable system integration, complex packaging, high cost, etc., to enhance recognition ability, reduce false alarm rate, cost high effect
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[0019] Such as figure 1 As shown, the infrared-ultraviolet multicolor detector grows AlN buffer layer, n-type GaN / AlGaN emission layer, non-doped AlGaN barrier layer, n-type AlGaN window contact layer, non-doped AlGaN absorption layer on the substrate sequentially. Layer, p-type AlGaN confining window layer and p-type GaN contact layer form a two-level convex multi-color detector mesa, with n-type GaN / AlGaN emitter layer and n-type AlGaN window contact layer as protrusions. There is an n-type lower contact electrode 3 on the boss of the n-type GaN / AlGaN emitter layer, an n-type middle contact electrode 2 on the boss of the n-type AlGaN window contact layer, and a p-type upper contact electrode on the p-type GaN contact layer. Contact electrode 1.
[0020] The substrate described in this infrared-ultraviolet multicolor detector is preferably Si, sapphire or silicon carbide polished substrate, in order to achieve better infrared / ultraviolet detection effect, such as figure 2 ...
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