Infrared-ultraviolet multi-color detector and production process thereof
A detector and ultraviolet technology, applied in the direction of semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of complex packaging, high cost, large volume, etc., simplify the growth process and processing technology, and improve radiation resistance ability, the effect of reducing the size of the device
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[0019] Such as figure 1 As shown, the infrared-ultraviolet multicolor detector grows AlN buffer layer, n-type GaN / AlGaN emission layer, non-doped AlGaN barrier layer, n-type AlGaN window contact layer, and non-doped AlGaN absorption layer sequentially on the substrate. Layer, p-type AlGaN confining window layer and p-type GaN contact layer form a two-level convex multi-color detector mesa, with n-type GaN / AlGaN emitter layer and n-type AlGaN window contact layer as protrusions. There is an n-type lower contact electrode 3 on the boss of the n-type GaN / AlGaN emitter layer, an n-type middle contact electrode 2 on the boss of the n-type AlGaN window contact layer, and a p-type upper contact electrode on the p-type GaN contact layer. Contact electrode 1.
[0020] The substrate described in this infrared-ultraviolet multicolor detector is preferably Si, sapphire or silicon carbide polished substrate, in order to achieve better infrared / ultraviolet detection effect, such as figur...
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