Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cut-flower cultivation device and method on protected ground

A technology for protected land and cut flowers, applied in the fields of botanical equipment and methods, cultivation, greenhouse cultivation, etc., can solve the problems of lack of cultivation facilities and cultivation methods, difficult production of cut flowers, high salt hazards, etc., to eliminate adverse effects and ensure normal operation. Growth, reducing the effect of environmental pollution

Inactive Publication Date: 2009-04-29
广东省农业科学院土壤肥料研究所
View PDF0 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cultivation of cut flowers is particularly special, and the problem to be solved urgently is how to produce cut flower products with good quality and large quantities without affecting the sustainable output of cut flowers
[0003] In recent years, although cut flower cultivation has begun to take shape in many areas of our country, due to the lack of better cultivation facilities and cultivation methods, there is greater blindness in management and technical implementation, which may easily cause continuous cropping obstacles and high salinity. Therefore, it is urgent to provide a set of cut flower cultivation facilities and cultivation methods suitable for China's national conditions as soon as possible.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cut-flower cultivation device and method on protected ground

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] 1. Facilities and methods for protected cultivation of cut flowers of gerbera:

[0030] 1. The length, width, and height of the brick wall of the flower pond are 1200m, 70cm, and 55cm respectively, and the thickness of the brick wall is 6cm, and then tightly place foam boards around the wall to form a heat insulation layer;

[0031] 2. Then pave a layer of gravel layer with a thickness of 3cm on the bottom layer of the brick wall, and then lay a layer of crushed Chinese herbal medicine residue, edamame, mushroom residue and bean cake with a thickness of 5cm. Including Radix Isatidis, Sophora flavescens, Artemisia argyi, Artemisia annua, Saponaria, and then fill it with a gerbera cultivation substrate, the thickness of which is 5cm lower than the edge of the fence; the formula of the gerbera cultivation substrate is peat 10-32% by volume. %, vermiculite 20-35%, perlite 25-30%, soil 18-30%.

[0032] Mix the above-mentioned ingredients of the cultivation base, and then di...

Embodiment 2

[0044] Protected cultivation facilities and methods for cut flowers of Phalaenopsis:

[0045] 1. The length, width, and height of the brick wall of the flower pond are 1000m, 60cm, and 45cm respectively, and the thickness of the brick wall is 5cm, and then tightly place asbestos boards around the wall to form a heat insulation layer;

[0046]2. Then pave a layer of gravel layer with a thickness of 3cm on the bottom layer of the brick wall, and then lay a layer of crushed Chinese herbal medicine slag, edamame, bran and bean cake with a thickness of 8cm. Including Radix Isatidis, Sophora flavescens, Folium Artemisiae Argyi, Andrographis paniculata, Fructus Cnidii, and then filling Phalaenopsis cultivation substrate on it, the thickness is lower than 8cm along the enclosure wall; wherein the formula of Phalaenopsis cultivation substrate is peat in volume percentage: coconut bran: Perlite = 1:1:1.

[0047] Mix the above ingredients of the cultivation base and then use a disinfect...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to the cultivation technical field of a cut flower, particularly to facilities for cultivation under cover and a cultivation method of the cut flower. The facilities for cultivation under cover of cut flower comprise wall bricks, a thermal insulating layer, a gravel layer, an organic material layer, a soil and / or substrate layer and a drip irrigation device. The facilities for cultivation under cover are characterized in that a flower pond is enclosed by the wall bricks; the thermal insulating layer is disposed on the inner wall of the flower pond; the sand layer gravel layer, the organic material layer, the soil and / or substrate layer and the thermal insulating layer are paved in the flower pond from the upside to the downside; and the drip irrigation device is mounted. The invention can effectively slow down the secondary salinization to the soil and substrate under cover, improve the permeability of the soil and the substrate, enhance the activity of the root system, increase the production of the cut flower, save water and fertilizer and lessen pollution to the surrounding environment.

Description

Technical field: [0001] The invention relates to the technical field of cultivation of cut flowers, in particular to protected cultivation facilities and cultivation methods of cut flowers. Background technique: [0002] With the development of the national economy, cut flowers are increasingly occupying an important position in people's lives, and they become a necessity in celebrations such as birthdays, weddings, festivals, and decorations in various places. Therefore, cut flowers are irreplaceable and indispensable to modern life. The cultivation of cut flowers is particularly special, and the problem to be solved urgently is how to produce cut flower products with good quality and large quantities without affecting the sustainable output of cut flowers. [0003] In recent years, although cut flower cultivation has begun to take shape in many areas of our country, due to the lack of better cultivation facilities and cultivation methods, there is greater blindness in man...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01G1/00A01G9/02A01G9/24A01G31/02A01G31/00
CPCY02A40/25Y02P60/21
Inventor 徐培智解开治陈建生张发宝唐拴虎黄旭顾文杰蒋瑞萍李苹刘春明李少红严超
Owner 广东省农业科学院土壤肥料研究所
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com