Ultraviolet/hot pressing curing type nano-printing method and stamping press

Abstract

The invention provides an UV / hot-pressing curing type nano-imprint method in which the imprint process is carried out in vacuum environment, the imprint driving force is controllable and steady high pressure gas, and adjustment and matching are carried out by combining the positive-negative pressure. When a bearing substrate and an imprint platform of an imprint template contact an imprint reference surface for imprinting, the imprint process is realized by an automatic leveling mechanism. The two means of the UV exposure curing as well as the heating and quick cooling curing are integrated, that is, the imprint reference surface is a UV-pervious quartz flat plate, and the imprint platform integrates a vacuum absorption sheet and a temperature-control electric heating furnace with a quick water cooling device and the like. The nano-imprint device obtained by the method has the advantages of reasonable and simple structure, simple operation, reliable and stable performance, high-efficiency and cheap preparation process, and high automation degree.

Description

1. Technical field [0001] The invention belongs to the application field of new technologies for advanced manufacturing of micro-nano structures and devices, and mainly relates to a new technology and process for the preparation and manufacture of micro-nano micro-structure materials and devices, which mainly includes the use of high-pressure gas in a vacuum environment. Nano-imprinting technology for nano- and micro-structures, nano-imprinting machine for curing imprinting adhesives using ultraviolet light and heating, and automatic control methods and structures for the entire process of imprinting and curing using PLC. 2. Background technology [0002] The manufacturing technology of microstructure materials and devices is the key technology in the fields of microelectronics, optoelectronics and integrated photonic devices. Because the current scientific research shows that many materials and devices show many new physical and chemical properties when they enter the micro...

AI Technical Summary

Problems solved by technology

These three types of embossing equipment have their own shortcomings. The first type of hot embossing requires relatively high pressure. Although air cushion embossing has both UV and heat curing imprinting functions, the embossing pressure is insufficient; the second type The residual layer of step exposure imprinting is uneven, and it is difficult to realize the accurate replication of large-area nanometer patterns; the third type of contact lithography imprinting has strict requirements on the size of the template and the substrate, and imprinting under atmospheric pressure, the pressure is insufficient, the template and the substrate Also can not be fully fit, easy to cause a large area of ​​embossing defects

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