Process for preparing nitrogen doped micropore titanium dioxide photocatalysis layer of visual light on base of titan and titan alloy
A technology of titanium dioxide and photocatalytic layer, which is applied in the direction of chemical instruments and methods, physical/chemical process catalysts, metal material coating technology, etc., can solve the problems of layer shedding, increase the weight of titanium and titanium alloys, etc., and achieve the removal of odor and harmful The effect of bacteria
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specific Embodiment approach 1
[0008] Specific Embodiment 1: In this embodiment, the method for preparing a nitrogen-doped microporous titanium dioxide visible light photocatalytic layer on a titanium and titanium alloy substrate is realized according to the following steps: 1. Perform oxygen plasma ion implantation treatment on titanium and titanium alloy, and after implantation Inject 3×10 at a voltage of 10-30kV 17 ~8×10 17 ion / cm 2 ; 2. The helium plasma ion implantation is divided into three steps. In the first step, 5×10 17 ~7×10 17 ion / cm 2 , the second step is to inject 2×10 17 ~4×10 17 ion / cm 2 , the third step is to inject 2×10 17 ~4×10 17 ion / cm 2 ; 3. Annealing treatment, annealing at 500-600°C for 1-2 hours, and then annealing at 600-700°C for 1-2 hours; 4. Carrying out argon plasma under the condition of substrate bias voltage of 600-800V Erosion for 3-5 hours to obtain titanium and titanium alloys with micropores on the surface; 5. Nitrogen ion implantation treatment, the implantati...
specific Embodiment approach 2
[0010] Specific embodiment 2: The difference between this embodiment and specific embodiment 1 is that in step 1, 6×10 17 ion / cm 2 . Other steps and parameters are the same as those in Embodiment 1.
specific Embodiment approach 3
[0011] Embodiment 3: The difference between this embodiment and Embodiment 1 is that the helium plasma ion implantation in step 2 is divided into three steps. In the first step, 6×10 17 ion / cm 2 , the second step is to inject 3×10 at the injection voltage of 30kV 17 ion / cm 2 , the third step is to inject 3×10 17 ion / cm 2 . Other steps and parameters are the same as those in Embodiment 1.
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