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Thin film solar cell of using ZnO as electrical isolation layer and impurity barrier layer, and preparation method

A technology for thin-film solar cells and electrical insulating layers, applied in circuits, photovoltaic power generation, electrical components, etc., can solve problems such as easy formation of pinholes, affecting resistivity improvement and blocking, and achieves improved performance, low preparation cost, and uniform film good sex effect

Inactive Publication Date: 2007-12-26
NANKAI UNIV
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Problems solved by technology

In addition, these materials have a good contact effect with the Mo conductive layer, but they are easy to form pinholes during the preparation process, which seriously affects the improvement of resistivity and the effect of blocking.

Method used

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  • Thin film solar cell of using ZnO as electrical isolation layer and impurity barrier layer, and preparation method

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Embodiment Construction

[0015] ZnO of the present invention is the thin-film solar cell of electrical insulation and impurity barrier layer, and its lightweight flexible substrate can be metal material substrate such as: stainless steel foil, Mo foil, Cu foil, Al foil or Ti foil etc., also can be polymer Material substrates such as: polyimide film and other insulating material substrates. On the substrate is a 0.8-4.0 μm ZnO electrical insulation and impurity blocking layer. The absorber layer is: CIGS, cadmium telluride, amorphous silicon, gallium arsenide, cadmium sulfide or dye TiO 2 and other photovoltaic materials.

[0016] The ZnO electrical insulation and impurity blocking layer can be a doped ZnO thin film or an intrinsic ZnO thin film. It can also be doped ZnO film or intrinsic ZnO film with Al 2 o 3 , SiO 2 Co-deposited or layer-deposited thin films. During the co-deposition, the three metal oxides are mixed in any proportion, and the thicknesses of the three metal oxides are respecti...

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Abstract

The disclosed ZnO impurity barrier layer and electrical isolation layer on metallic substrate is suitable to flexible photo-volt battery. Using pure zinc target or ZnO ceramics target etc, through sputtering technique, the invention deposits ZnO thin film on metal substrate. Adjusting flow ratio between Ar and O2 obtains ideal ZnO film. The ZnO film with compact structure of thin film possesses better effect for blocking off impurity inside metal substrate, and better effect of insulation. The disclosed ZnO is in use for preparing batteries and subassembly with flexible metal substrate.

Description

【Technical field】 [0001] The invention relates to a manufacturing process of a thin-film solar cell device, in particular to a thin-film solar cell in which ZnO is deposited on a flexible substrate by a magnetron sputtering method as an electrical insulation and impurity barrier layer and a preparation method thereof. 【Background technique】 [0002] The development of human society is accompanied by the increase of energy consumption. At the same time, the reserves of conventional energy (such as oil, coal, etc.) are decreasing year by year, and the use of conventional energy causes environmental pollution and climate deterioration, leading to increasingly serious pollution and damage to the earth's ecological environment. . Therefore, the research, development and utilization of "renewable energy" and "green energy" are becoming more and more important and urgent. Among them, solar energy is undoubtedly the first choice for human future energy. Since the 1970s, many count...

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Application Information

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IPC IPC(8): H01L31/042H01L31/02H01L31/18H01L31/0445H01L31/0749
CPCY02E10/50Y02E10/541Y02P70/50
Inventor 施成营孙云何青李凤岩赵久成
Owner NANKAI UNIV
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