Ultraviolet photo-cured radical type etching glue for micro nano structure imprinting and copying

Abstract

The invention relates to a micro-nano structural imprint-copy-used ultraviolet light curing free radical type etching gum which has the composing of: a curing body 1 is bisphenol A-epoxy acrylic ester or phenolic epoxy acrylic ester which is 24 to 48% by weight, a curing body 2 also a thinner is tripropylene glycol genus acrylic ester which is 20 to 46% by weight, a curing auxiliaries is dipentaerythritol-6-acrylic ester or GP-537 or GP-71-SS which is 5 to 16% by weight, a photo-initiation is 2,4,6-methylbenzene formyl radicel diphenyl phosphine oxide which is 5 to 16% by weight, the sum of each weight of the component is 100%. In addition, in order to regulate the viscosity of the solution, the thinner 1,6hexandiol twain acrylic ester is added until the viscosity of the solution is satisfied. Compared with the other gum, the gum of the invention has the advantages of: high curing speed, small constringency, low viscosity, high adhesive force, strong against corrosion, simple confect art and convenient application.

Description

Technical field [0001] The invention is an ultraviolet light-curable free radical type etching adhesive for micro-nano structure imprinting and copying, and belongs to the technical field of etching (agent) adhesives. Background technique [0002] With the continuous advancement of micro-nano structure processing technology, it is necessary to process and replicate patterns as small as a few to tens of nanometers, and a large number of nano-level patterns also include micro-level structural patterns. At the same time, it is necessary to achieve It can meet the high-efficiency requirements of mass replication and production, and traditional optical lithography replication technology can no longer meet the needs of micro-nano structure processing. In recent years, there has been a new technology with simple operation, high resolution, and large-scale production of nano-patterned structures by imprinting and copying technology. This technology is composed of soft-engraving and copyi...

AI Technical Summary

Problems solved by technology

[0003] In the currently used flash imprint replication technology, since the etchant used is further supplemented and modified from the etchant used in the previous imprint replication technology, there are certain deficiencies in performance and efficiency. The joint density and curing speed are not large enough, even some UV-curable cationic etching adhesives specially developed for nanoimprint replication also have insufficient curing speed, and the price is expensive and the preparation process is complicated, which is not conducive to popularization and application.

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