Etching solution composition for metal foil using silver as main composition

Abstract

The liquid composition for etching a metallic thin film consisting essentially of silver is obtained by blending, by weight, 40 to 50% phosphoric acid, 1.5 to 3.5% nitric acid, 25 to 40% acetic acid, and water.

Description

technical field [0001] The present invention relates to an etchant composition for use in the production of metal thin films containing silver as a main component for flat panel displays and the like. Background technique [0002] In the past, aluminum thin films have been used as reflective plates and reflective electrode materials for reflective and transflective liquid crystal display devices. In recent years, metal thin films mainly composed of silver, which have higher reflectance than aluminum and lower resistance characteristics, have attracted attention. (Refer to Patent Documents 1 and 2). [0003] Although silver has disadvantages such as poor microfabrication and easy reaction with chlorides, sulfides, etc., due to its high conductivity and reflectivity, it has been used to form a transparent conductive film on the silver film and achieve low resistance of wiring. currently using. [0004] As an etchant for a silver thin film, (1) dilute nitric acid and (2) ammo...

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Problems solved by technology

[0015] Documentation is arranged, as the etchant of silver alloy, because the mixed acid etching rate of phosphoric acid, nitric acid, acetic acid, water is too high, so add 20~40% by weight ethylene glycol or glycerol (patent document 8) in this mixed acid, but , the disadvantage is that the amount of water-soluble organic components is large and the load on the environment is large