Gold evaporative sources with reduced contaminants and methods for making the same

Abstract

A unique sequence of steps is provided to reduce contaminants along one or more surfaces and faces of gold evaporative sources without deleteriously impacting the structure of the gold evaporative sources. Edges are deburred; contaminants are successfully removed therealong; and surface smoothness is substantially retained. The resultant gold evaporative source is suitable for use in evaporative processes as a precursor to gold film deposition without the occurrence or a substantial reduction in the likelihood of spitting by virtue of significantly reduced levels of contaminants, in comparison to gold evaporative sources subject to a standard cleaning protocol.

Description

FIELD OF THE INVENTION[0001]The present invention relates to gold evaporative sources with reduced residual surface contaminants and a unique method for removing such contaminants.BACKGROUND OF THE INVENTION[0002]Evaporation is a thin-film deposition process utilized for creating thin-film layers of gold onto a wafer. FIG. 1 shows a representative example of an evaporative process 100 for depositing thin-film layers of gold. The tool utilized in the process 100 is commonly referred to as a planetary evaporation tool 101. Solidified gold material 102 (refer to hereafter as a “gold evaporative source”) is placed in a crucible 103. Electron beam or resistance heating elements can serve as the heat source 104 to melt the gold evaporative source 102. The melting of the gold evaporative source 102 creates a liquid pool 105 as shown in FIG. 1. The gold evaporative source in molten form is further heated until vaporization occurs. The gold vapor traverses upwards within the interior of the ...

AI Technical Summary

Benefits of technology

The patent describes a process for making gold evaporative sources with reduced surface contaminants. The process involves burning the sources in the presence of a liquid slurry to remove any contaminants along their surfaces. The sources are then leached with boiling nitric acid to further remove any remaining contaminants without altering the surface roughness. This results in a more pure gold evaporative source with improved stability and performance. The patent also describes a method for making the sources by reducing the diameter of a cast billet, coiling it, and slicing it to form the desired sources. This method also allows for better control over the surface roughness of the sources.

Problems solved by technology

This phenomenon is known as “spitting” and is recognized as detrimental to film quality by virtue of the creation of in-film defects known as nodules or particles contained or embedded within the deposited gold film.

Such nodules are further problematic as they can significantly lower production yields and lead to device malfunction by a breakdown of the layered structures of the device.

Although such process conditions and parameters can be adjusted, spitting remains a prevalent problem during the gold evaporative process 100.

Additionally, end-users are often limited in their degree of freedom to alter conditions and parameters from established set points or target values.

However, the problem of inadvertent liquid droplet ejection from the crucible still occurs.

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