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Diamond Uses/Applications Based on Single-Crystal CVD Diamond Produced at Rapid Growth Rate

a technology of diamond and single crystal, which is applied in the field of diamond use/application, can solve the problems of limiting the applicability of sc-cvd diamonds produced so far, affecting the applicability of diamond-based electronics, and affecting the application of diamonds, etc., and achieves the effect of rapid growth rate and rapid growth ra

Inactive Publication Date: 2010-01-21
CARNEGIE INSTITUTION OF WASHINGTON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This approach enables the production of large, high-quality, colorless or colored single-crystal diamonds with increased growth rates, suitable for various industrial and research applications, including wear-resistant materials, optics, electronics, and high-pressure apparatuses, by minimizing defects and impurities.

Problems solved by technology

SC-CVD diamonds reported so far, however, are relatively small, are discolored, and / or are flawed.
Large (e.g., over three carats, as commercially available high pressure, high temperature (HPHT) synthetic Ib yellow diamond), colorless, flawless synthetic diamonds remain a challenge due to slow growth and other technical difficulties [7, 8, 9].
The color of SC-CVD diamonds in the absence of HPHT annealing can range from light brown to dark brown, thus limiting their applicability as gems, in optics, in scientific research, and in diamond-based electronics [6, 7, 8].
The large SC-CVD diamonds produced so far present problems because of the brownish color.
Until now, few attempts have been made to develop products which use single-crystal diamonds produced by MPCVD.
Moreover, few attempts have been made to develop uses and applications for single-crystal diamonds that are not doped with impurities.

Method used

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  • Diamond Uses/Applications Based on Single-Crystal CVD Diamond Produced at Rapid Growth Rate
  • Diamond Uses/Applications Based on Single-Crystal CVD Diamond Produced at Rapid Growth Rate
  • Diamond Uses/Applications Based on Single-Crystal CVD Diamond Produced at Rapid Growth Rate

Examples

Experimental program
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example 1

[0101]A diamond growth process was conducted in the above-described MPCVD chamber in FIG. 1. First, a commercial 3.5×3.5×1.6 mm3 high pressure high temperature (HPHT) synthetic type Ib diamond seed was positioned in the deposition chamber. The diamond seed has polished, smooth surfaces that were ultrasonically cleaned with acetone. The deposition surface was within two degrees of the {100} surface of the diamond seed.

[0102]Then, the deposition chamber was evacuated to a base pressure of 10−3 torr. The infrared pyrometer 142 was focused though a quartz window at an incident angle of 65 degrees on the growth surface of the diamond and had a minimum 2 mm2 diameter spot size. Diamond growth was performed at 160 torr pressure using gas concentrations of 15% O2 / CH4, and 12% CH4 / H2. The process temperature was 1020° C., and gas flow rates were 500 sccm H2, 60 sccm CH4, and 1.8 sccm O2. Deposition was allowed to continue for 12 hours.

[0103]The resulting diamond was 4.2×4.2×2.3 mm3 unpolishe...

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Abstract

The present invention is directed to new uses and applications for colorless, single-crystal diamonds produced at a rapid growth rate. The present invention is also directed to methods for producing single crystal diamonds of varying color at a rapid growth rate and new uses and applications for such single-crystal, colored diamonds.

Description

STATEMENT OF GOVERNMENT INTEREST[0001]This invention was made with Government support under Grant No. EAR-0421020 awarded by the National Science Foundation. The Government has certain rights in this invention.INCORPORATION-BY-REFERENCE OF MATERIAL SUBMITTED ON A COMPACT DISC[0002]Not applicable.SEQUENCE LISTING[0003]Not applicable.BACKGROUND OF THE INVENTION[0004]1. Field of the Invention[0005]The present invention relates to uses and applications for diamond. More particularly, the present invention relates to applications and uses of single-crystal diamond produced at a high growth rate using Microwave Plasma Chemical Vapor Deposition (MPCVD) within a deposition chamber.[0006]2. Description of Related Art[0007]Large-scale production of synthetic diamond has long been an objective of both research and industry. Diamond, in addition to its gem properties, is the hardest known material, has the highest known thermal conductivity, and is transparent to a wide variety of electromagnet...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C30B25/00B32B3/10
CPCC30B25/105Y10T428/24802C30B29/04C30B25/18
Inventor HEMLEY, RUSSELL J.MAO, HO-KWANGYAN, CHIH-SHIUE
Owner CARNEGIE INSTITUTION OF WASHINGTON
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