Double heater and chemical vapor deposition process for preparing super conductive film therein

A technology of chemical vapor deposition and superconducting thin film, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of affecting film quality, difficult film thickness, poor uniformity, etc., and achieves low cost, The effect of good uniformity and easy operation

Inactive Publication Date: 2007-06-27
GUIZHOU UNIV
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Problems solved by technology

[0002] At present, there are many methods for preparing superconducting thin films, such as laser deposition, sputtering, molecular beam epitaxy, etc., but most methods can only prepare single-layer superconducting thin films, and single-layer superconducting thin films can generally only be used to prepare superconducting wires. , its use is relatively single, while multilayer superconducting thin films can be used to make superconducting devices or integrated circuits, etc., and have a wide range of uses
Chinese Patent No. 03117799.9 discloses a "one-step process of double-heater in-situ chemical vapor deposition of magnesium boride superconducting film", which adopts a one-step method to prepare superconducting film, and makes superconducting film on the substrate in one step, although The preparation process is simple, but it cannot be used to prepare multilayer superconducting thin films, and the heating method of the substrate is radiative point heating, so the film area that can be formed is small and the uniformity is poor. In addition, it controls the thickness of the deposited film by adjusting the ventilation time and heating temperature. These methods are difficult to accurately control the thickness of the deposited film. Its air intake method is to directly feed diborane gas. The distribution in the deposition chamber cannot be particularly uniform, which affects the film quality

Method used

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  • Double heater and chemical vapor deposition process for preparing super conductive film therein

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Embodiment

[0016] Embodiment: the substrate heater 2 is fixed above the deposition chamber 1, the substrate placement surface 4 faces downward, the substrate heater 2 is heated by resistance wire, and its heating temperature range is 400-550° C., the magnesium ingot heater 3 is connected with the deposition chamber The bottom of the chamber 1 is connected by a screw 8, the magnesium ingot placement surface 5 is upward, and the heating temperature range of the magnesium ingot heater 3 is 650-800°C. One end of the deposition chamber 1 is provided with a gas mixing chamber 7, and the gas mixing chamber 7 passes through the air vent 6 Connected with the deposition chamber 1 , the gas mixing chamber 7 is provided with an air inlet 9 , and the deposition chamber 1 is provided with a vacuum pump 10 .

[0017] The substrate heater 2 is heated by resistance wire to ensure that the substrate maintains a uniform temperature during the heating process, so that a large-area film can be generated. The ...

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Abstract

The double heater apparatus includes one deposition chamber, one substrate heater fixed over the deposition chamber with one downwards substrate setting plane, one magnesium ingot heater connected to the lower inside of the deposition chamber with one upwards magnesium ingot setting plane, one air port to the deposition chamber and one vacuum pump. The apparatus of the present invention has simple structure, easy operation and low cost, and is used for chemical vapor deposition process preparing multilayer superconductive film with high homogeneity and great area for practical application.

Description

technical field [0001] The invention relates to a superconducting film production device and a preparation process thereof, in particular to a double heating device and a process for preparing a multilayer superconducting film by a chemical vapor deposition method. Background technique [0002] At present, there are many methods for preparing superconducting thin films, such as laser deposition, sputtering, molecular beam epitaxy, etc., but most methods can only prepare single-layer superconducting thin films, and single-layer superconducting thin films can generally only be used to prepare superconducting wires. , its use is relatively single, and the multilayer superconducting film can be used to make superconducting devices or integrated circuits, etc., and has a wide range of uses. Chinese Patent No. 03117799.9 discloses a "one-step process of double-heater in-situ chemical vapor deposition of magnesium boride superconducting film", which adopts a one-step method to prep...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/46C23C16/30C23C16/52
Inventor 傅兴华王松杨发顺杨健
Owner GUIZHOU UNIV
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