Equipment and method for low temperature depositing high-quality decorative film by electric arc ion plating

Abstract

The arc ion plating and depositing high-quality decorative film method comprises: using cathode arc source with double-EM field to filter large grain and impulse negative bias voltage to control deposition temperature in arc ion plating. Compared with prior art, this invention deposits high-quality Cr, Zr, Ti, Al and alloy or nitrate film or carbide film to meet decorative request and resistance to wear and corrosion, reduces little efficiency, improves quality greatly special the film surface quality, and has wide application.

Description

technical field [0001] The invention belongs to the technical field of metal material surface modification. Background technique [0002] Ion plating technology has been used in the deposition and preparation of decorative films for decades. Arc ion plating, because it generally uses multiple cathode arc sources to work simultaneously, it is also called multi-arc ion plating. It is the ion plating form with the highest ionization rate. It is mainly used in the field of depositing synthetic carbon and nitrogen compound hard films on the surface of tools and molds; arc ion plating is also used to deposit synthetic decorative films, but there have always been two main deficiencies. Since arc ion plating is always accompanied by arc ion plating in the process of arc evaporation to obtain plasma, the unique droplets, also known as large particles, are ejected at the same time as plasma, which pollutes the quality of the film and makes the surface of the film Second, the deposit...

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Problems solved by technology

Arc ion plating, because it generally uses multiple cathode arc sources to work simultaneously, it is also called multi-arc ion plating. It is the ion plating form with the highest ionization rate. It is mainly used in the field of depositing synthetic carbon and nitrogen compound hard films on the surface of tools and molds; arc ion plating is also used to deposit synthetic decorative films, but there have always been two main deficiencies. Since arc ion plating is always accompanied by arc ion plating in the process of arc evaporation to obtain plasma, the unique droplets, also known as large particles, are ejected at the same time as plasma, which pollutes the quality of the film and makes the surface of the film Second, the deposition temperature of arc ion plating is relatively high, generally maintained between 400°C and 500°C, which limits the deposition of thin films of materials with low melting points or low tempering temperatures

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