Preparation method of stable water-soluble niobium and tantalum precursor and application thereof

Abstract

The invention provides a preparation method of stable water-soluble niobium and tantalum precursor, which comprises using pentoxide of tantalum or niobium as raw material, mixing columbium pentachloride or ttantalum pentachloride with potassium hydroxide or sodium hydroxide, grinding homogeneously, carrying out incandesce reacting 2-4 hours at 400-550 deg. C, obtaining fusing agent of potassium (sodium) niobate or potassium (sodium) tantalite, dissolving the fluxing agent into deionized water, filtering the solution till the solution shows strong acidity (pH<2), so that the niobium or tantalum in the solution can be fully precipitated in the form of niobic acid or tantalic acid. Finally charging right amount of citric acid water solution into columbic acid or charging right amount of oxalic acid into tantalic acid deposition, thus obtaining water-soluble niobium precursor or oxalate aqueous solution of tantalum.

Description

technical field [0001] The present invention relates to the preparation method of stable water-soluble niobium and tantalum precursor and its application in the preparation of ferroelectric film and powder. Background technique [0002] Ferroelectric materials (such as Sr x Ba 1-x Nb 2 o 6 (SBN), LiNbO 3 , LiTaO 3 , SrBi 2 Ta 2 o 9 (SBT)SrBi 2 Nb 2 o 9 ) is an important class of functional materials with ferroelectric, piezoelectric, pyroelectric, electro-optic, acousto-optic, and nonlinear optical effects, and has broad application prospects in the fields of microelectronics and optoelectronics. Wet chemical methods include sol-gel method (So1-gel), metal organic decomposition method (Metalorganic decomposition, MOD) and chemical solution deposition method (Chemical solution deposition, CSD), etc., and the films and powders prepared by them have high micro-domain components. Uniformity, accurate stoichiometric ratio, easy doping, easy ...

AI Technical Summary

Problems solved by technology

However, the main disadvantage of the alkoxide-based process is that tantalum ethoxide and niobium ethoxide are expensive and extremely sensitive to moisture. During the preparation process, a strictly dry environment is required, usually in a glove box (Glove box), some chemical reactions Need to be done on a Schlenk vacuum line

The storage of the prepared precursor solution also needs to be waterproof and the service life is short

Although some improvement measures have been adopted, such as the use of ligands such as ethylene glycol methyl ether to replace alkoxy groups, which has partially improved the stability of the precursor, but this problem cannot be fundamentally solved, and it also greatly limits the use of similar precursor systems. commercial application of

Tantalum pentachloride and niobium pentachloride have also been used as precursors of tantalum or niobium, although relative to alkoxides, its price is cheaper and its stability has improved, however, the inevitable small amount of residual chlorine in the final material may can degrade the optoelectronic properties of the material

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