Titanium-containing target material and preparation method thereof

Abstract

The invention provides a titanium-containing target material and a preparation method thereof, and the preparation method comprises the following steps: sequentially carrying out forging, primary heat treatment, cold rolling and secondary heat treatment on a titanium-containing target material blank to obtain the titanium-containing target material. According to the method, a proper preparation process is selected according to the material of the target material, the heat treatment and rolling processes are controlled, the internal organization structure of the target material is optimized, and the recrystallization process and the grain size uniformity of the target material are controlled, so that the coating uniformity during target material sputtering can be improved, and the coating quality can be improved; according to the method, the strength of the target material can be effectively enhanced, and cracks are prevented from being generated during high-power sputtering; the method is simple to operate, low in required cost and wide in application range.

Description

technical field [0001] The invention belongs to the technical field of target material preparation, and relates to a titanium-containing target material and a preparation method thereof. Background technique [0002] Magnetron sputtering technology is one of the key technologies for preparing thin film materials, and the target is the key consumable in the magnetron sputtering process. The sputtering method mainly refers to the process of bombarding the surface of the target with high-energy particles, so that the atoms or molecules on the surface of the target are sprayed on the surface of the substrate to form a dense film. There are high requirements for its uniformity, which requires first ensuring the uniformity of the internal structure of the sputtering target, so as to ensure the uniformity of the coating. Therefore, the processing and preparation of the target requires different processes according to different materials. [0003] The processing and preparation of ...

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Problems solved by technology

[0003] The processing and preparation of the target usually adopts forging, hot rolling, cold rolling and other processing methods, and then undergoes heat treatment and necessary mechanical processing to prepare target products that meet the requirements. However, traditional operation steps are often difficult to effectively adjust the internal temperature of the target. structure, it is difficult to control the uniformity of the target grain size, so that the uniformity of the film during sputtering coating cannot be guaranteed; in addition, due to the different target materials, sometimes it is necessary to use high-power sputtering. Cracks are generated, which affects the sputtering coating process. Therefore, it is necessary to select an appropriate processing technology according to the different target materials, so that it can not only optimize the internal structure, but also enhance the strength of the target.

[0004] CN 103215553A discloses a method for preparing a high-purity titanium plate for a target. The method includes: pressing sponge titanium particles into an electrode block, and then welding the electrode block into a consumable electrode; The ingot is obtained by arc melting; the ingot is subjected to the first heat treatment; the ingot is subjected to upsetting and forging to obtain the slab; the slab is subjected to the second heat treatment; and then rolled to obtain the semi-finished plate; the semi-finished plate After annealing, straightening and surface grinding, the high-purity titanium plate for the target is obtained; this method has many operation steps, and an important explanation is made for the preparation process of the ingot. The heat treatment and subsequent upsetting forging are also for the ingot. It is set based on defects, and its influence on the internal crystal structure is not clear, and the heat treatment temperature is high, and the energy consumption is large

[0005] CN 106884142A discloses a method for preparing a high-quality TiN thin film, which includes the following steps: select Ti ingots to make titanium strips through forging, rolling, heat treatment, leveling and machining; and then perform laser engraving on them , and use a rolling machine to roll the engraved titanium strip into a titanium ring. After cleaning and drying, the sputtered titanium ring is obtained; the steel sheet is used as the substrate, and the titanium ring and titanium palladium are bonded with conductive adhesive as the target material. Deposit TiN film on the steel sheet; the preparation of the sputtered titanium ring is only one step in this method, the focus is on the preparation of the TiN film, and the sputtered titanium ring is not the main part of the target, it is assembled with the titanium target For the target, the preparation process of the titanium ring does not mention the regulation of the internal tissue structure