Manufacturing method of high-quality quartz crucible
What is Al technical title?
Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A technology for a quartz crucible and a manufacturing method, which is applied to chemical instruments and methods, manufacturing tools, glass molding, etc., can solve the problems of high cost, limited quality of quartz crucibles, limited current size, etc., so as to improve production quality and reduce collapse. rate, the effect of reducing air bubbles
Pending Publication Date: 2022-05-13
JINZHOU YOUXIN QUARTZ TECH
View PDF5 Cites 0 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
The position of the graphite electrode in the FT method is fixed, and only regular drop compensation is made for the consumption of the graphite electrode (drop a certain distance to compensate for the loss of the electrode). At the same time, the existing preparation method only improves the production quality of the quartz crucible by adjusting the current.
However, in actual production, it is found that the improvement of the quality of the quartz crucible is very limited only by adjusting the current size, and once the production equipment is built, the current size that the hardware can carry is limited, so it is difficult to improve the production quality of the crucible by replacing the high current. , and the cost of changing the hardware and rebuilding the equipment is also very high
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1
[0060] The present embodiment provides a high-quality quartz crucible production method for making an outer diameter of 26 inches of quartz crucible, using a vacuum arc method, the steps are as follows:
[0061] (1) Uniformly distribute high-purity quartz sand powder in the crucible mold and form;
[0062] (2) The mold after molding is moved into the arc melting furnace;
[0063] (3) Set the position of the upper end face of the mold to zero, and the PLC program controls the position of the graphite electrode Figure 4 As shown, the quartz crucible is melted. In the figure, the graphite electrode works in a total of 7 positions, the starting position stays for 3min, the second position stays for 3min, the third position stays for 3min, the fourth position stays for 1.8min, the fifth position stays for 1.8min, the bottom polishing position stays for 3.6min (310mm from the bottom of the crucible), and the tail sweeping station stays for 1.8min.
[0064] In the melting process, the po...
Embodiment 2
[0068] The present embodiment is based on Example 1, the PLC programmatically controls the positioning of the graphite electrode, such as Figure 5 As shown, the quartz crucible is melted. In the figure, the graphite electrode works in a total of 7 positions, the starting position stays for 3min, the second position stays for 2min, the third position stays for 3.1min, the fourth position stays for 2.7min, the fifth position stays for 1.8min, the bottom polishing position stays for 3.6min (300mm from the bottom of the crucible), and the tail sweeping station stays for 1.8min.
Embodiment 3
[0070] The present embodiment is based on Example 1, the PLC programmatically controls the positioning of the graphite electrode, such as Figure 6 As shown, the quartz crucible is melted. In the figure, the graphite electrode works in a total of 7 positions, the starting position stays for 3min, the second position stays for 2min, the third position stays for 2.2min, the fourth position stays for 3.6min, the fifth position stays for 1.8min, the bottom polishing position stays for 3.6min (350mm from the bottom of the crucible), and the tail sweeping station stays for 1.8min.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
PUM
Login to view more
Abstract
The invention relates to a manufacturing method of a high-quality quartz crucible, a vacuum arc method is adopted for melting, and the displacement of a graphite electrode and the retention time on each position meet the following conditions: the end face position of an upper opening of a mold is taken as a zero point, the end of the graphite electrode above the zero point is +, and the end of the graphite electrode below the zero point is-; the initial position of the graphite electrode is + 0.10-0.30 times of the outer diameter of the crucible, the retention time is greater than or equal to 2 minutes, then the graphite electrode is sequentially descended according to a step displacement method, the graphite electrode is retained for a period of time every time when the graphite electrode is descended, and the graphite electrode reaches the bottom polishing position after displacement is carried out for at least 3 times; the bottom polishing position is the lowest position where the graphite electrode reaches, enters the crucible blank and is 300-550mm away from the bottom of the crucible; at the position, the graphite electrode stays and performs high-temperature polishing and volatilization impurity removal on the bottom of the crucible; the outer diameter of the crucible is + 0.05-0.07 times of the outer diameter of the crucible, and high-temperature volatilization impurity removal is carried out on the upper portion of the inner wall of the quartz crucible at the tail sweeping station. The method is used for improving the purity of the transparent layer of the crucible, enhancing the high-temperature deformation resistance and the like.
Description
Technical field [0001] The present invention relates to the field of monocrystalline silicon production technology, in particular, a method of making quartz crucibles used when manufacturing silicon monocrystallines by Czochralski method (hereinafter referred to as CZ straight-pull method). Background [0002] Silicon single crystal is one of the most important raw materials for making silicon-based semiconductor materials and solar cells. Silicon single crystals are mainly produced by CZ direct drawing. In the CZ straight-pull method, the polycrystalline silicon raw material is placed in the quartz crucible to heat the molten silicon melt, and the tie rod drives the seed crystal down so that it contacts the silicon melt, and then slowly lifts the seed crystal upward to form a silicon single crystal rod. Quartz crucibles are generally double-layered structures, with a transparent layer without bubbles on the inner wall and a non-transparent layer with more bubble content on the ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to view more 
Login to view more