Method for preparing component gradient composite coating through double-atmosphere self-adaptive reactive sputtering

Abstract

The invention provides a method for preparing a component gradient composite coating through double-atmosphere self-adaptive reactive sputtering. A light guide pipe connected with a monochromator is arranged at the position, adjacent to the end of a target material, of a sputtering chamber cavity; the monochromator is guided into a target surface plasma area emission spectrum through the light guide pipe and sends a spectrum intensity signal to a reaction atmosphere controller after distinguishing the intensity of the target surface plasma area emission spectrum, and the reaction atmosphere controller controls the N2 supply amount of the self-adaptive reaction according to the spectrum intensity of the target surface plasma area; the sputtering chamber is also connected with an O2 gas path controlled by a mass flow meter; the mass flow meter interferes with the emission spectrum intensity of the target surface plasma area at a target material by controlling the O2 gas input quantity, so that the reaction atmosphere controller adjusts the supply quantity of N2 in the self-adaptive reaction according to the standard of the spectral line intensity of the same characteristic spectrum, and the ratio of N2 to O2 in the target surface plasma area is matched in a self-adaptive manner; and according to the invention, the reaction gas can be continuously and adaptively matched with the gas proportion according to the set reaction degree.

Description

technical field [0001] The invention relates to the technical field of preparation of advanced functional coatings, in particular to a method for preparing composition gradient composite coatings by dual-atmosphere adaptive reactive sputtering. Background technique [0002] Composition gradient composite coating is an effective means to solve the high temperature stability of functional coatings and achieve thermal stress matching. The preparation of composition gradient coatings by magnetron sputtering depends on the precise control and matching of target atomic sputtering yield and reactant gas flow rate, as well as the precise identification of the degree of reaction progress. In the actual deposition process, the sputtering yield is generally controlled by the target current, and there is a nonlinear and complex relationship between the sputtering yield and the current value. In engineering practice, it is difficult to accurately quantify the sputtering yield of target a...

AI Technical Summary

Problems solved by technology

In the actual deposition process, the sputtering yield is generally controlled by the target current, and there is a nonlinear and complex relationship between the sputtering yield and the current value. In engineering practice, it is difficult to accurately quantify the sputtering yield of target atoms, and the gas flow rate is determined by the mass flow meter. Direction control, reactive sputtering process is unstable, metal compound coatings are often mixed with metal elements, high-temperature performance of functional coatings is unstable, and long-term service is often accompanied by slow metal atom oxidation and nitriding processes, resulting in performance deterioration

[0003] In actual engineering, it is necessary to obtain the maximum degree of response and avoid "target poisoning". The gas supply is difficult to be accurately controlled by the mass flow meter MFC, which needs to be solved

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