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Precise movement air floatation supporting device

A support device and precision motion technology, applied in the direction of air cushion bearings, bearings, shafts and bearings, can solve the problems that cannot meet the high-speed and high-precision motion requirements of the micro-motion stage of the lithography machine, the complex space occupancy of the air flotation system, the air Problems such as the high quality of the floating support frame structure

Pending Publication Date: 2021-12-24
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The air-floating supporting frame structure of the micro-moving table of the existing lithography machine is of high quality, the air-floating system is complex and the space occupation rate is high, which cannot meet the high-speed and high-precision movement requirements of the micro-moving table of the lithography machine, which seriously limits the precision of the chip manufacturing process further improvement of

Method used

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  • Precise movement air floatation supporting device
  • Precise movement air floatation supporting device
  • Precise movement air floatation supporting device

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Embodiment Construction

[0030] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0031] It should be understood that the terms "front", "rear" and the like are used in the present invention to describe various information, but the information should not be limited to these terms, and these terms are only used to distinguish the same type of information from each other. For example, "before" information could also be called "after" information, and "after" information could also be called "before" information without departing from the scope of the present invention. Specifically, in the embodiment of the present invention, the installation direction of the guide rail is defined as the Y direction.

[0032] like Figure 1 to Figure 8 As shown, the emb...

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Abstract

The invention relates to the technical field of precise movement, and discloses a precise movement air floatation supporting device which comprises a base, a guide rail and a supporting frame, wherein the guide rail is horizontally arranged on the base and fixedly connected with the base, the supporting frame is arranged on the guide rail in a sleeving mode and can slide along the guide rail, and the supporting frame comprises a bottom air floatation plate, a top air floatation plate and lateral air floatation plates; the number of the lateral air floating plates is two, the two lateral air floating plates are symmetrically arranged, lateral air paths are arranged in the lateral air floating plates, lateral air inlet holes and lateral exhaust holes which are communicated with the lateral air paths are formed in the surfaces of the lateral air floating plates, and a bottom surface air path is arranged in the bottom air floating plate. And the surface of the bottom air floating plate is provided with a bottom surface air inlet hole and a bottom surface air outlet hole which are communicated with the bottom surface air path. Compared with the prior art, the precise movement air floatation supporting device is simple and reliable in structural design, the air inlet and outlet holes and the air path design can effectively reduce the space occupation amount of an air source, the supporting frame has good movement posture and movement precision, and the use experience of operators is good.

Description

technical field [0001] The invention relates to the technical field of precision motion, in particular to an air bearing support device for precision motion. Background technique [0002] As a core component of the semiconductor processing industry, lithography machines are important equipment for high-end electronic chip manufacturing. With the continuous breakthrough of Moore's law of the number of transistors in a chip per unit area, the traditional low-speed, low-precision ordinary lithography machine has been difficult to meet the market demand. It must have the motion conditions of high precision, high speed and high acceleration. At the same time, the lithography machine is a highly integrated product of the semiconductor etching process. The stroke of each moving part in the whole machine has strict requirements, and the space layout must be reasonable and compact. [0003] Existing lithography machines include a light source, an optical path system, a mask stage, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F16C32/06
CPCF16C32/0603
Inventor 吴剑威赵鹏越刘江王继尧郑健赵博谭久彬
Owner HARBIN INST OF TECH
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