Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin

A technology containing sulfur benzophenone and sulfur benzophenone, applied in application, coating, ink, etc., can solve problems such as slow curing rate, easy yellowing of cured coating, and irritating odor of toxic substances. Achieve excellent flexibility and high self-initiation efficiency

Inactive Publication Date: 2021-11-30
SHAOGUAN HEZHONG CHEM CO LTD +1
View PDF1 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it still has disadvantages such as slow curing rate, easy yellowing of the cured coating, easy migration to the surface, strong volatility, large heat loss, production of toxic substances and strong pungent odor during use.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin
  • Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin
  • Sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] Preparation of the 3rd generation dendritic polymer HPB-3, the steps are as follows: add 15.6 parts of neopentyl glycol, 40.6 parts of 2,2-dimethylolpropionic acid, 12.5 parts of xylene, and 0.2 parts of catalyst p-toluenesulfonic acid Put it into a four-necked flask equipped with a stirrer, a thermometer, an addition funnel and a reflux water separator, and heat it under nitrogen protection to 140-150°C for reflux reaction for 1-2 hours. When the detected acid value is lower than 25mgKOH / g, add 80.4 parts of 2,2-dimethylolpropionic acid, 0.4 parts of p-toluenesulfonic acid and 16.0 parts of xylene, reflux reaction at 140~150℃ for 1~2h, when the detected acid value is lower than 25mgKOH / g, then Add 160.8 parts of 2,2-dimethylolpropionic acid, 0.8 parts of p-toluenesulfonic acid and 32.0 parts of xylene respectively, and after reflux reaction at 140-150 ° C for 2 hours, the temperature is raised to 180 ° C to continue the reaction until the detected acid value is low Sto...

Embodiment 2

[0052] Preparation of isocyanate-acrylic acid functional monomer TDI-HEMA: Add 104.4 parts of TDI-80 and 0.07 parts of DBTDL into a four-neck flask equipped with a reflux condenser, thermometer, dropping funnel and stirrer, stir and raise the temperature, at 30-45°C Slowly add a mixture of 78.0 parts of methacrylate-α-hydroxyethyl methacrylate, 0.12 parts of hydroquinone and 40.0 parts of acetone dropwise, after the addition is complete, raise the temperature to 45-50°C to continue the reaction for 3.5 hours, and then take samples every 30 minutes The NCO value of the system was detected, and the reaction was stopped when the detected NCO value was half of the initial value, and the temperature was lowered to 40°C to prepare the isocyanate-acrylic acid functional monomer TDI-HEMA.

Embodiment 3

[0054] Preparation of isocyanate-acrylic acid functional monomer IPDI-HEA: Add 44.5 parts of IPDI and 0.03 parts of DBTDL to a four-necked flask equipped with a reflux condenser, a thermometer, a dropping funnel and a stirrer, stir to raise the temperature, and slowly Add dropwise a mixture of 23.2 parts of β-hydroxyethyl acrylate, 0.03 parts of hydroquinone and 20.0 parts of acetone. After the addition is complete, raise the temperature to 45-50°C to continue the reaction for 3 hours, and then take samples every 30 minutes to detect the NCO value of the system , when the detected NCO value is half of the initial value, the reaction is stopped, and the temperature is lowered to 40°C to prepare the isocyanate-acrylic acid functional monomer IPDI-HEA.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to sulfur-containing benzophenone modified third-generation dendritic self-initiation UV resin and a preparation method thereof. The self-initiation UV resin takes neopentyl glycol as a core, has a Boltom type dendritic structure and contains a plurality of functional active groups, a plurality of sulfur-containing benzophenone photo-initiation groups and a plurality of branched chain bulk alkane groups. The resin has pigment bearing performance, high solid content, low viscosity and storage stability. The self-initiation efficiency is high, and the defects of low curing rate, easy yellowing of a coating, surface migration, strong volatility, large heat loss, generation of harmful substances and pungent smell and the like of an additional BP initiator are overcome. The dendritic self-initiation UV resin prepared by the invention has excellent flexibility, adhesive force, chemical resistance, heat resistance, aging resistance, oil resistance, wear resistance, pollution resistance and impact strength, is odorless in coating, and can be used for UV colored floor coatings, UV wood coatings, UV alloy coatings, UV circuit board ink and UV plastic coatings.

Description

technical field [0001] The invention relates to a modified self-initiating photocurable resin, in particular to a sulfur-containing benzophenone-modified third-generation dendritic self-initiating UV resin and a preparation method thereof, belonging to the technical field of synthetic resins. Background technique [0002] In recent years, environmentally friendly coatings, including high solids and solvent-free coatings, water-based coatings, powder coatings and light-curing coatings, have achieved rapid development. Light curing technology has the advantages of fast curing, high production efficiency, room temperature operation, low energy consumption, low VOC, environmental protection, high quality, economy, and is suitable for a variety of substrates. It has been widely used in printing, packaging, advertising, building materials, decoration, electronics, etc. , communications, computers, stores, automobiles, aviation, aerospace, instrumentation, sports, health and many o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08G63/91C08G63/02C08G83/00C09D167/06C09D187/00C09D11/101
Inventor 许钧强孙小光周强富康伦国姚东生郭红桥
Owner SHAOGUAN HEZHONG CHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com