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Method for preparing silicon-vanadium-iron nitride by vacuum resistance method

A technology of silicon vanadium nitride and resistance method is applied in the field of preparing silicon vanadium nitride ferronitride by vacuum resistance method. Effect

Active Publication Date: 2021-11-05
宁夏中宏氮化制品有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation method disclosed in this patent technology is carbothermal reduction nitriding method, the main disadvantages are: long process and complicated process
[0006] The Chinese patent document with the publication number CN111621686A discloses a high-nitrogen, low-oxygen silicon-vanadium ferro-nitride alloy and its preparation method. The method is produced in a micro-positive pressure environment of 0.18-0.2 MPa, and is divided into two steps at different temperatures. Nitriding vanadium and silicon, the main disadvantages of this method are: the nitriding of vanadium element is completed in a concentrated manner, a large amount of heat is easy to accumulate in a short time, and the local temperature rises rapidly in many places, resulting in multiple occurrences of molten metal.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Vacuum resistance method prepares the method for silicon nitride iron vanadium, comprises the steps:

[0033] Step 1: batching, the ferrosilicon vanadium that 60 mesh~120 mesh quality is 5800kg and the silicon nitride that 60 mesh~120 mesh quality are 200kg are uniformly mixed (namely ferrosilicon vanadium and ferrosilicon nitride are 97% according to mass ratio: 3% ratio), and then evenly spread in the high temperature resistant feeding device, the laying thickness is 8cm, and the feeding device is an open non-closed structure. The composition and mass fraction of silicon vanadium iron described in this step are respectively V:34%, Si:16%, C:2%, P:0.2%, S:0.1%, all the other are iron, described nitriding The components and mass fractions of silicon are TN: 29%, Si: 52%, and the rest is iron.

[0034] Step 2: Place the feeding device described in step 1 in a vacuum resistance furnace, and then energize and heat up the vacuum resistance furnace after vacuuming;

[0035...

Embodiment 2

[0044] Vacuum resistance method prepares the method for silicon nitride iron vanadium, comprises the steps:

[0045] Step 1: batching, the ferrosilicon vanadium that 60 mesh~120 mesh quality is 6400kg and the silicon nitride that 60 mesh~120 mesh quality are 340kg are evenly mixed (namely ferrosilicon vanadium and ferrosilicon nitride are 95% according to mass ratio: 5% ratio), and then evenly spread in the high temperature resistant feeding device, the laying thickness is 10cm, and the feeding device is an open non-closed structure. The composition and mass fraction of silicon vanadium iron described in this step are respectively V:35%, Si:18%, C:1.5%, P:0.15%, S:0.05%, all the other are iron, described nitriding The components and mass fractions in silicon are TN: 30%, Si: 50%, and the rest are iron;

[0046] Step 2: Place the feeding device described in step 1 in a vacuum resistance furnace, and then energize and heat up the vacuum resistance furnace after vacuuming;

[0...

Embodiment 3

[0058] Vacuum resistance method prepares the method for silicon nitride iron vanadium, comprises the steps:

[0059] Step 1: batching, the ferrosilicon vanadium that is 7250kg with 60 mesh~120 mesh quality is mixed with the silicon nitride that 60 mesh~120 mesh quality is 550kg (namely ferrosilicon vanadium and ferrosilicon nitride are 93% according to mass ratio: 7% ratio evenly mixed), and then evenly spread in the high temperature-resistant feeding device, the laying thickness is 20cm, and the feeding device is an open non-closed structure. The composition and mass fraction of silicon vanadium iron described in this step are respectively V:37%, Si:23%, C:2%, P:0.18%, S:0.05%, all the other are iron, described nitriding The components and mass fractions of silicon are TN: 32%, Si: 47%, and the rest is iron.

[0060] Step 2: Place the feeding device described in step 1 in a vacuum resistance furnace, and then energize and heat up the vacuum resistance furnace after vacuuming...

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Abstract

The invention provides a method for preparing silicon-vanadium-iron nitride by a vacuum resistance method. The method comprises the following steps of firstly, mixing materials, uniformly mixing silicon nitride particles and silicon-vanadium-iron particles, reacting with nitrogen in a vacuum environment in high-temperature environments of different intervals for a certain time, and cooling to obtain the silicon-vanadium-iron nitride. According to the method, the flame-retardant effect of ferro silicon nitride is utilized to prevent metal combustion smelting spreading caused by overhigh local temperature in the nitriding reaction from hindering the nitriding reaction of the raw material, four temperature control intervals are set to ensure that the temperature at different positions of the raw material layer tends to be uniform, nitrogen uniformly permeates to different positions of the raw material layer, meanwhile, the nitriding reaction is conducted in different temperature intervals, the process of an exothermic reaction is dispersed, heat cannot be gathered in a short time, the melting phenomenon at multiple positions is avoided, and the uniformity and consistency of the finally formed silicon-vanadium-iron nitride are good.

Description

technical field [0001] The invention belongs to the technical field of ferrosilicon nitride preparation, and relates to a method for preparing ferrosilicon vanadium nitride, in particular to a method for preparing ferrosilicon vanadium nitride by a vacuum resistance method. Background technique [0002] At present, the methods for preparing ferrosilicon vanadium nitride mainly include self-propagating combustion method, briquette firing method, carbothermal reduction nitriding method, ferrosilicon vanadium nitriding, etc., but all have shortcomings in various degrees. The method of silicon nitride vanadium alloy generally has problems such as long process flow and high resource consumption. [0003] The Chinese patent document with the publication number CN103526098A discloses a ferro-silicon-vanadium alloy and its production method. The method adopts a self-propagating combustion method to produce a ferrosilicon-vanadium alloy. In this method, the ferrosilicon-vanadium allo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22C1/05C22C29/16
CPCC22C1/056C22C29/16
Inventor 李春德张磊刘金怀耿桂宏王耀鹏杨丽燕
Owner 宁夏中宏氮化制品有限公司
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