Method for preparing silicon-vanadium-iron nitride by vacuum resistance method
A technology of silicon vanadium nitride and resistance method is applied in the field of preparing silicon vanadium nitride ferronitride by vacuum resistance method. Effect
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Embodiment 1
[0032] Vacuum resistance method prepares the method for silicon nitride iron vanadium, comprises the steps:
[0033] Step 1: batching, the ferrosilicon vanadium that 60 mesh~120 mesh quality is 5800kg and the silicon nitride that 60 mesh~120 mesh quality are 200kg are uniformly mixed (namely ferrosilicon vanadium and ferrosilicon nitride are 97% according to mass ratio: 3% ratio), and then evenly spread in the high temperature resistant feeding device, the laying thickness is 8cm, and the feeding device is an open non-closed structure. The composition and mass fraction of silicon vanadium iron described in this step are respectively V:34%, Si:16%, C:2%, P:0.2%, S:0.1%, all the other are iron, described nitriding The components and mass fractions of silicon are TN: 29%, Si: 52%, and the rest is iron.
[0034] Step 2: Place the feeding device described in step 1 in a vacuum resistance furnace, and then energize and heat up the vacuum resistance furnace after vacuuming;
[0035...
Embodiment 2
[0044] Vacuum resistance method prepares the method for silicon nitride iron vanadium, comprises the steps:
[0045] Step 1: batching, the ferrosilicon vanadium that 60 mesh~120 mesh quality is 6400kg and the silicon nitride that 60 mesh~120 mesh quality are 340kg are evenly mixed (namely ferrosilicon vanadium and ferrosilicon nitride are 95% according to mass ratio: 5% ratio), and then evenly spread in the high temperature resistant feeding device, the laying thickness is 10cm, and the feeding device is an open non-closed structure. The composition and mass fraction of silicon vanadium iron described in this step are respectively V:35%, Si:18%, C:1.5%, P:0.15%, S:0.05%, all the other are iron, described nitriding The components and mass fractions in silicon are TN: 30%, Si: 50%, and the rest are iron;
[0046] Step 2: Place the feeding device described in step 1 in a vacuum resistance furnace, and then energize and heat up the vacuum resistance furnace after vacuuming;
[0...
Embodiment 3
[0058] Vacuum resistance method prepares the method for silicon nitride iron vanadium, comprises the steps:
[0059] Step 1: batching, the ferrosilicon vanadium that is 7250kg with 60 mesh~120 mesh quality is mixed with the silicon nitride that 60 mesh~120 mesh quality is 550kg (namely ferrosilicon vanadium and ferrosilicon nitride are 93% according to mass ratio: 7% ratio evenly mixed), and then evenly spread in the high temperature-resistant feeding device, the laying thickness is 20cm, and the feeding device is an open non-closed structure. The composition and mass fraction of silicon vanadium iron described in this step are respectively V:37%, Si:23%, C:2%, P:0.18%, S:0.05%, all the other are iron, described nitriding The components and mass fractions of silicon are TN: 32%, Si: 47%, and the rest is iron.
[0060] Step 2: Place the feeding device described in step 1 in a vacuum resistance furnace, and then energize and heat up the vacuum resistance furnace after vacuuming...
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