Substrate surface micro-processing method, composite substrate and LED epitaxial wafer
A substrate surface and composite substrate technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., to achieve the effects of increasing surface area, improving light reflection efficiency, and increasing external quantum efficiency
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[0039] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.
[0040] figure 1 The flow chart of a micro-processing method for the substrate surface provided by the embodiment of the present invention, this embodiment is applicable to the preparation of the surface microstructure of the sapphire substrate, and further, the prepared sapphire substrate can be used to prepare the LED Epiwafer. like figure 1 As shown, the microprocessing method includes:
[0041] S101, providing a substrate.
[0042] like figure 2 As shown, the substrate 101 can be a planar single crystal s...
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