Wafer wet etching equipment
A wet etching, wafer technology, used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as large differences in etching rates in different chambers
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[0028] The wafer wet etching equipment structure of specific embodiment of the present invention sees figure 1 .
[0029] figure 1 Among them, NV is the needle valve (Needle Valve); AV is the air valve (Air Valve); TC is the temperature controller (Temperature Controller); FM is the flow meter (Flow meter).
[0030] The wafer wet etching equipment includes an etchant, which is placed in a storage container 1, and the usual storage capacity is 40L. In this embodiment, the etchant is TMAH tetramethylammonium hydroxide.
[0031] The pipelines connected with the storage container 1 include a main pipeline 5 , a pressure relief pipeline 14 , an auxiliary pipeline 15 and a recovery pipeline 3 . The main pipeline 5 includes a pump 2, a heater 4, a flow meter, a temperature controller and the like. The pressure relief pipeline 14 includes a pressure sensor, a pressure regulator and the like.
[0032] The heater 4 is used to control the temperature of the etchant on the main pipeli...
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