A dm-shws modeling method based on complete second-order system response

A DM-SHWS, second-order system technology, applied in the field of DM-SHWS modeling based on complete second-order system response, can solve problems such as laser communication system performance degradation, achieve good noise resistance, enhance effectiveness, and ensure accuracy sexual effect

Active Publication Date: 2022-06-07
ZHEJIANG UNIV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If adaptive optics compensation is not properly implemented, the performance of laser communication systems will be greatly degraded

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A dm-shws modeling method based on complete second-order system response
  • A dm-shws modeling method based on complete second-order system response
  • A dm-shws modeling method based on complete second-order system response

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] In this embodiment, the actual control voltage range of the deformable mirror is 0-287V as an example, and the implementation process is introduced as follows:

[0046] (1) Establish a complete second-order system response model of the adaptive optics system, as follows:

[0047] The actual control voltage range of the deformable mirror is from 0V to 287V, the corresponding digital voltage command range is from 0 to 4095, and the maximum stroke v max is 4095. For the purpose of reserving the protection voltage space, the present invention defines that the voltage command interval that can be implemented in the experiment is 4 / 5 of the maximum stroke, ranging from 448 to 3648. In order to make the reflective surface of the deformed mirror have the ability of bidirectional movement correction, the initial reference surface voltage command is set to 2048. In the actual calculation process, the voltage command needs to be normalized in advance, so that the normalized comm...

Embodiment 2

[0077]In order to verify the accuracy of fitting the conversion relationship between the light spot offset and the electrode channel configuration command by the complete second-order system response matrix, the present invention introduces the evaluation index of the offset error ratio, on the basis of establishing the system response matrix , assign random instructions to the deformable mirror, calculate the difference vector between the random offset vector of the light spot reconstructed based on the system response matrix and the offset vector actually configured by the random instruction, and count the number of light spots in the difference vector that are larger than the noise threshold, Get its ratio to the total number of spot offsets. The representational form of the offset error ratio is as follows:

[0078]

[0079] Among them, number( ) represents the number of members in the statistical vector that meet the conditions, d actual represents the actual wavefron...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a DM-SHWS modeling method based on the complete second-order system response. The method builds a complete second-order system response model of the adaptive optical system based on the characteristics of the nonlinear response of the deformable mirror, and characterizes the The conversion relationship between the command and the light spot offset of the Shack-Hartmann wavefront sensor; the model is calibrated using the experimental test data of the adaptive optics system, and the noise equalization method of the constant term is given. Considering the limited accuracy of the traditional adaptive optics system model, this model includes the second-order, first-order and constant terms of the deformable mirror order. The complete second-order system response model shows better fitting results to the actual offset, and the accuracy rate is higher than 95% for the random command offset error accounting for less than 10%. The complete second-order system response model of the invention has validity and accuracy, and is of great significance to the fields of laser communication and laser radar of adaptive optical wavefront correction.

Description

technical field [0001] The invention relates to the fields of laser communication and laser radar, in particular to a DM-SHWS (Deformable Mirror-Shack Hartmann wavefront) based on a complete second-order system response for atmospheric turbulence correction in a free space laser communication and laser radar system sensor) modeling method. Background technique [0002] Laser technology has the advantages of high symbol rate, abundant frequency band resources, and high security: in the field of wireless communication, it can realize ultra-high-speed gigabit wireless communication with large capacity; in the field of radar, it can realize high-precision distance measurement. The laser signal is affected by environmental factors such as atmospheric humidity, temperature, and wind speed, and the optical signal is disturbed by the intensity and phase, which seriously reduces the signal quality of the transmitted beam, resulting in the degradation of the performance of communicati...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G06F30/20G02B27/00G06F119/10
CPCG06F30/20G02B27/0012G06F2119/10Y02A90/10
Inventor 虞温豪钟杰
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap