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Moisturizing and repairing facial mask fluid and preparation method therefor

A technology of mask liquid and fullerene stock solution, which is applied in the preparation of moisturizing and repairing mask liquid, mask liquid, and moisturizing and repairing mask liquid. Firming, balancing water and oil, and regulating skin immunity

Active Publication Date: 2021-08-13
广州欧正化妆品技术研究院有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003]However, although there are many types of facial masks currently on the market, their quality is uneven, and their efficacy often does not meet the desired effect of users

Method used

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  • Moisturizing and repairing facial mask fluid and preparation method therefor
  • Moisturizing and repairing facial mask fluid and preparation method therefor
  • Moisturizing and repairing facial mask fluid and preparation method therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] A moisturizing and repairing facial mask liquid provided by the present invention comprises the following components in percentage by weight: 0.5% hydrogenated lecithin, 0.05% water-soluble fullerene stock solution, 8.0% tremella polysaccharide, 1% emollient, and phytosphingosine 0.3%, Sodium Myristoyl Glutamate 0.05%, Squalane 0.5%, C12-20 Alkyl Glucoside 0.1%, Dimethicone Crosspolymer 0.1%, Dipotassium Glycyrrhizinate 0.02%, Moisturizing composition 3.0%, repairing composition 0.5%, white lily flower water 1.0%, preservatives%, deionized water to 100%;

[0049] The moisturizing composition is 8g of peach fruit extract, 4g of oat bran extract, 3g of Lactobacillus / milk / fermentation product filtrate, and 1g of Alteromonas fermentation product extract;

[0050] The restoration composition is 6g of Artemisia umbelliferous extract, 9g of Zizhi lucidum extract, 3g of Gorgonian coral extract, 3g of plankton extract, and 4g of Cistanche deserticola extract.

[0051] Described...

Embodiment 2

[0053] A moisturizing and repairing facial mask liquid provided by the present invention comprises the following components by weight percentage: 3.0% hydrogenated lecithin, 3.0% water-soluble fullerene stock solution, 2.0% tremella polysaccharide, 3.0% emollient, and phytosphingosine 0.05%, Sodium Myristoyl Glutamate 0.3%, Squalane 0.05%, C12-20 Alkyl Glucoside 0.3%, Dimethicone Crosspolymer 0.2%, Dipotassium Glycyrrhizinate 0.5%, 0.5% moisturizing composition, 2.0% repairing composition, 0.5% geranium flower water, 2.0% preservative, deionized water to 100%;

[0054] The moisturizing composition is 5g of peach fruit extract, 6g of oat bran extract, 1g of Lactobacillus / milk / fermentation product filtrate, and 3g of Alteromonas fermentation product extract;

[0055] The restoration composition is 9g of Artemisia umbelliferous extract, 6g of Zizhi lucidum extract, 5g of Gorgonian coral extract, 1g of plankton extract, and 4g of Cistanche deserticola extract.

[0056] Described ...

Embodiment 3

[0058] A moisturizing and repairing facial mask liquid provided by the present invention comprises the following components in percentage by weight: 1.0% hydrogenated lecithin, 1.0% water-soluble fullerene stock solution, 5.0% tremella polysaccharide, 2.0% emollient, and phytosphingosine 0.1%, Sodium Myristoyl Glutamate 0.1%, Squalane 0.1%, C12-20 Alkyl Glucoside 0.2%, Dimethicone Crosspolymer 0.05%, Dipotassium Glycyrrhizinate 0.1%, Moisturizing composition 2.0%, repairing composition 1.0%, peony flower water 1.0%, preservative 2.0%, deionized water to 100%;

[0059] The moisturizing composition is 6g of peach fruit extract, 5g of oat bran extract, 2g of Lactobacillus / milk / fermentation product filtrate, and 2g of Alteromonas fermentation product extract;

[0060] The restoration composition is 7g of Artemisia umbelliferous extract, 7g of Zizhi lucidum extract, 4g of Gorgonian coral extract, 2g of plankton extract, and 3g of Cistanche deserticola extract.

[0061] Described e...

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Abstract

The invention discloses moisturizing and repairing facial mask fluid and a preparation method therefor. The invention aims at providing the absorption-facilitated facial mask fluid with excellent moisturizing and repairing effects and the preparation method therefor. The facial mask fluid comprises the following ingredients in percentage by weight: 0.5%-5.0% of hydrolecithin, 0.05%-3.0% of water-soluble fullerene stock solution, 2%-8.0% of tremella polysaccharides, 1%-3.0% of emollient, 0.05%-0.3% of phytosphingosine, 0.05%-0.3% of sodium myristoyl glutamate, 0.05%-0.5% of squalane, 0.1%-0.3% of C12-20 alkyl glucoside, 0.02%-0.1% of polydimethylsiloxane-crosslinked polymer, 0.02%-0.5% of dipotassium glycyrrhetate, 0.5%-3.0% of moisturizing composition, 0.5%-2.0% of repair composition, 0.5%-1.0% of aromatizer, 1%-2.0% of preservative and the balance of deionized water. The invention belongs to the technical field of cosmetics.

Description

technical field [0001] The invention relates to a facial mask liquid, in particular to a moisturizing and repairing facial mask liquid. The invention also relates to a preparation method of a moisturizing and repairing facial mask liquid, which belongs to the technical field of cosmetics. Background technique [0002] The mask is known as the skin savior. The mask uses the short time covered on the face to temporarily isolate the outside air and pollution, allowing water to slowly penetrate into the stratum corneum of the epidermis. The cells in the upper layer fully absorb water in a humid environment, so that the collagen in the deep cells absorbs enough water. The temperature of the skin surface rises, which will also expand the pores and promote the secretion of sweat glands, which is conducive to the removal of external dust, chemical pollutants and microorganisms contaminated in the pores, and also helps to eliminate waste and accumulation produced by the metabolism of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/99A61K8/41A61K8/55A61K8/92A61K8/9728A61K8/9789A61K8/9794A61K8/98A61K8/19A61Q19/08A61Q19/00A61P29/00
CPCA61K8/553A61K8/41A61K8/19A61K8/922A61K8/9789A61K8/9794A61K8/99A61K8/986A61K8/9728A61K8/987A61Q19/00A61Q19/08A61P29/00A61K2800/5922A61K2800/85A61K2800/782
Inventor 张磊胡波黄斌斌
Owner 广州欧正化妆品技术研究院有限公司
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