Anti-reflection anti-wide infrared high temperature resistant resin lens and preparation method thereof
A high-temperature-resistant resin and resin lens technology, applied in glasses/goggles, instruments, optics, etc., can solve the problems of poor temperature and environment resistance, high stress of finished lenses, and inability to meet various wave bands, etc., to reduce reflection properties, high refractive index, and the effect of avoiding high stress of the film layer
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Embodiment 1
[0068] An anti-reflection and anti-wide infrared resin lens, which includes: a resin lens substrate 1 (MR-8); a hardening layer 2 (Z117) / 2.6-3 μm; Oxide layer 3-1 (where SiO 2 and B 2 o 3 Mole percent: 92% SiO 2 , 8% B 2 o 3 ; Entrust Changzhou Zhanchi Photoelectric Technology Co., Ltd. to develop and produce, the material model is BL08) / 24.2nm, ITO layer 3-2 / 27.68nm, silicon boron composite oxide layer 3-3 / 32.44nm (material is the same as 3- 1), TiO 2 Layer 3-4 / 127.45nm, silicon boron composite oxide layer 3-5 / 177.92nm (materials are the same as 3-1), TiO 2 Layer 3-6 / 19.8nm, ITO layer 3-7 / 67.75nm; silicon-boron composite oxide layer 3-8 / 74.1nm (material is the same as 3-1); waterproof layer 4 adopts fluorine-containing waterproof material (such as containing perfluorinated Tributylamine (C 12 f 27 N)) / 10nm; The preparation method of the resin lens comprises the following steps:
[0069] S1: Make the hardening layer: immerse the ultrasonically cleaned resin lens subs...
Embodiment 2
[0081] An anti-reflection and anti-wide infrared resin lens, which includes: a resin lens substrate 1 (MR-8); a hardening layer 2 (Z117) / 2.6-3 μm; an anti-reflection layer 3 including: a silicon-boron composite oxide layer 3 -1 (where SiO 2 and B 2 o 3 Mole percent: 80% SiO 2 , 20%B 2 o 3 ; Entrust Changzhou Zhanchi Photoelectric Technology Co., Ltd. to develop and produce, the material model is BL20) / 24.2nm, ITO layer 3-2 / 27.68nm, silicon boron composite oxide layer 3-3 / 32.44nm (material is the same as 3- 1), TiO 2 Layer 3-4 / 127.45nm, silicon boron composite oxide layer 3-5 / 177.92nm (materials are the same as 3-1), TiO 2 Layer 3-6 / 19.8nm, ITO layer 3-7 / 67.75nm; silicon-boron composite oxide layer 3-8 / 74.1nm (materials are the same as 3-1); waterproof layer 4 is made of fluorine-containing waterproof material (containing perfluorinated three Butylamine (C 12 f 27 N)) / 10nm; the preparation method of the resin lens is the same as in Example 1.
Embodiment 3
[0083] An anti-reflection and anti-wide infrared resin lens, which includes: a resin lens substrate 1 (MR-8); a hardening layer 2 (Z117) / 2.6-3 μm; an anti-reflection layer 3 including: a silicon-boron composite oxide layer 3 -1 (where SiO 2 and B 2 o 3 Mole percent: 92% SiO 2 , 8% B 2 o 3 ; Entrust Changzhou Zhanchi Photoelectric Technology Co., Ltd. to develop and produce, the material model is BL08) / 24.2nm, ITO layer 3-2 / 28.0nm, silicon boron composite oxide layer 3-3 / 33.29nm (material is the same as 3- 1), TiO 2 Layer 3-4 / 129.92nm, silicon-boron composite oxide layer 3-5 / 175.14nm (materials are the same as 3-1), TiO 2 Layer 3-6 / 32.6nm, ITO layer 3-7 / 48.0nm; silicon-boron composite oxide layer 3-8 / 80.52nm (materials are the same as 3-1); waterproof layer 4 is made of fluorine-containing waterproof material (containing perfluorinated three Butylamine (C 12 f 27 N)) / 10nm; the preparation method of the resin lens is the same as in Example 1.
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