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Preparation method of photocatalytic film based on Mo-doped TaN as well as product and application of photocatalytic film based on Mo-doped TaN

A photocatalytic film and photocatalytic material technology, which is applied in the field of photocatalytic film preparation, can solve the problems of difficult recycling, large influence of process factors, and difficult shape control, etc., so as to improve TaN photocatalytic activity, repeatability and stability. Good controllability and the effect of improving light absorption performance

Active Publication Date: 2021-06-18
江苏镕耀新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In previous studies, in order to increase the contact area between the catalyst and the water body, most photocatalysts were designed as powder materials. Although the photocatalytic efficiency was improved, it was greatly affected by process factors, the shape was not easy to control, and it was prone to agglomeration. Poor stability, difficult to recycle and reuse, easy to cause secondary pollution and other problems

Method used

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  • Preparation method of photocatalytic film based on Mo-doped TaN as well as product and application of photocatalytic film based on Mo-doped TaN
  • Preparation method of photocatalytic film based on Mo-doped TaN as well as product and application of photocatalytic film based on Mo-doped TaN
  • Preparation method of photocatalytic film based on Mo-doped TaN as well as product and application of photocatalytic film based on Mo-doped TaN

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] The specific process of the photocatalytic film based on Mo-doped TaN is:

[0034] a. The FTO transparent conductive film substrate was ultrasonically cleaned with acetone, ethanol and deionized water for 15 minutes respectively;

[0035] b. Dry the cleaned substrate, and use it as a substrate, put it on the substrate holder of the magnetron sputtering chamber, vacuumize the chamber and heat the substrate;

[0036] c. Using magnetron sputtering technology, argon and nitrogen with a purity of 99.999% are used as sputtering gas and reaction gas respectively under high temperature and high vacuum environment, and Mo with a thickness of about 200nm is prepared by double-target co-sputtering method Doped TaN film layer. Among them, the sputtering power of the tantalum target is 130W, and a DC sputtering source is used; the sputtering power of the molybdenum target is 10W, and a radio frequency sputtering source is used to prepare the photocatalytic film TaN@Mo-10W / FTO based...

Embodiment 2

[0039] The specific process of the photocatalytic film based on Mo-doped TaN is:

[0040] a. The FTO transparent conductive film substrate was ultrasonically cleaned with acetone, ethanol and deionized water for 15 minutes respectively;

[0041] b. Dry the cleaned substrate, and use it as a substrate, put it on the substrate holder of the magnetron sputtering chamber, vacuumize the chamber and heat the substrate;

[0042]c. Using magnetron sputtering technology, argon and nitrogen with a purity of 99.999% are used as sputtering gas and reaction gas respectively under high temperature and high vacuum environment, and Mo with a thickness of about 200nm is prepared by double-target co-sputtering method Doped TaN film layer. Among them, the sputtering power of the tantalum target is 130W, and a DC sputtering source is used; the sputtering power of the molybdenum target is 20W, and a radio frequency sputtering source is used to prepare the photocatalytic film TaN@Mo-20W / FTO based ...

Embodiment 3

[0045] The photocatalytic film based on Mo-doped TaN of the present invention, its specific process is:

[0046] a. The FTO transparent conductive film substrate was ultrasonically cleaned with acetone, ethanol and deionized water for 15 minutes respectively;

[0047] b. Dry the cleaned substrate, and use it as a substrate, put it on the substrate holder of the magnetron sputtering chamber, vacuumize the chamber and heat the substrate;

[0048] c. Using magnetron sputtering technology, argon and nitrogen with a purity of 99.999% are used as sputtering gas and reaction gas respectively under high temperature and high vacuum environment, and Mo with a thickness of about 200nm is prepared by double-target co-sputtering method Doped TaN film layer. Among them, the sputtering power of the tantalum target was 130W, and a DC sputtering source was used; the sputtering power of the molybdenum target was 40W, and a radio frequency sputtering source was used to prepare the photocatalyti...

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Abstract

The invention relates to the technical field of photocatalytic film materials, in particular to a preparation method of a photocatalytic film based on Mo-doped TaN as well as a product and application of the photocatalytic film based on Mo-doped TaN. Specifically, argon serves as sputtering gas, nitrogen serves as reaction gas, the photocatalytic film based on Mo-doped TaN is prepared on the surface of a substrate through a double-target co-sputtering method, and the double targets are a tantalum target and a molybdenum target. The invention provides a preparation method of the photocatalytic film based on Mo-doped TaN. A TaN film is applied to the field of photocatalysis for the first time, and the photocatalytic performance of the TaN film is improved by selecting Mo as a doping agent through a magnetron sputtering vacuum coating technology, so that the light absorption performance of the film and the carrier transport characteristic in the film are improved, and the photocatalytic performance is improved.

Description

technical field [0001] The invention relates to the technical field of photocatalytic thin film materials, in particular to a method for preparing a photocatalytic thin film based on Mo-doped TaN and its product and application. Background technique [0002] In the 21st century, ecological and environmental governance issues have become the focus of the world, and environmental problems such as water pollution are getting worse. Therefore, it is particularly important to develop effective sewage treatment technologies. Photocatalytic technology can use photocatalytic materials to absorb solar energy to degrade organic pollutants in water. Therefore, finding efficient, stable, recyclable, pollution-free, simple and low-cost photocatalytic materials has always been the most challenging in solar energy utilization. one of the subjects. In previous studies, in order to increase the contact area between the catalyst and water, most photocatalysts were designed as powder material...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06C23C14/54C02F1/30C02F101/30
CPCC23C14/0036C23C14/3464C23C14/0641C23C14/54C02F1/30C02F2305/10C02F2101/30
Inventor 顾明道李兴鳌杜明张健
Owner 江苏镕耀新材料有限公司
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