Solar cell silicon wafer cleaning agent and solar cell silicon wafer cleaning method

Abstract

The invention discloses a solar cell silicon chip cleaning agent and a solar cell silicon chip cleaning method. According to weight percentage, the solar cell silicon chip cleaning agent consists of 0.02-1.0% surfactant, 0.1-0.8% chelating agent, Composed of 0.02‑1.0% complex enzyme, 0.03‑2.0% salt and the rest water. The silicon wafer cleaning agent for solar cells has the characteristics of no volatilization, no irritating smell, strong cleaning effect, and fluorine-free environmental protection, and can effectively remove inorganic particles and organic stains adsorbed on the surface of silicon wafers. The cleaned silicon wafer obtains a high-quality textured surface with good uniformity, high nucleation density and low reflectivity in the subsequent texturing process.

Description

technical field [0001] The invention relates to solar cell silicon wafers, in particular to a solar cell silicon wafer cleaning agent and a solar cell silicon wafer cleaning method. Background technique [0002] With the depletion of conventional energy and the increasingly prominent environmental problems, new energy with environmental protection and renewable characteristics has been paid more and more attention by governments of various countries, and the development and utilization of new energy has become the focus of global attention. Solar energy is favored by people because of its non-polluting, renewable, and non-regional advantages. The solar photovoltaic industry has also developed rapidly. [0003] In the solar cell manufacturing process, silicon wafer is an important component in solar photovoltaic power generation equipment. Silicon wafer is the core component of solar cell, and its various performance parameters directly affect the power generation efficiency...

AI Technical Summary

Problems solved by technology

Although rough polishing can remove the surface damage layer and remove surface pollutants to a certain extent, the rough polishing process consumes a lot of alkali, resulting in a large amount of silicon wafer thinning and a high fragmentation rate

In addition, after rough polishing and cleaning, the suede surface obtained by making texture is larger, the uniformity is poor, the nucleation is low, and the reflectivity of the obtained silicon wafer is high, which leads to low conversion efficiency of the battery

[0006] Of course, in addition to the above-mentioned coarse throwing process, there is also a method of cleaning with chemical reagents. For example, the patent document of Publication No. CN108559639A discloses "a cleaning solution for the surface treatment of black silicon cells, which consists of fluorine compounds, alcohol additives, It is prepared by mixing complexing agent, dispersant, surfactant and deionized water. The mass percentage of each raw material is: fluorine compound 8%-25%, alcohol auxiliary agent 5%-30%, complexing agent 2%- 6%, dispersant 4%-15%, surfactant 5%-10%, deionized water 14%-76%"; the cleaning solution uses fluorine compounds, which are harmful to the environment and do not meet the current environmental protection requirements ; At the same time, the use of the cleaning solution is relatively harsh, and the surface of the black silicon cell can be effectively cleaned only under ultrasonic conditions.

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