Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Oligomer suitable for photocuring ink-jet ink and preparation method thereof

An inkjet ink and oligomer technology, which is applied in the field of photocurable inkjet ink oligomers and its preparation, can solve the problems of ink printing instability, poor fluidity, and insufficient cohesion, so as to ensure printing fluency , Excellent dilutability, low curing shrinkage effect

Active Publication Date: 2021-06-11
珠海君奥新材料科技有限公司
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the ink printing instability caused by low molecular weight UV resin due to insufficient cohesion in the formulation application of UV ink and high molecular weight UV resin due to poor compatibility and fluidity. Printing is not smooth, and a kind of oligomer suitable for photocurable inkjet ink is proposed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Oligomer suitable for photocuring ink-jet ink and preparation method thereof
  • Oligomer suitable for photocuring ink-jet ink and preparation method thereof
  • Oligomer suitable for photocuring ink-jet ink and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] refer to Figure 1-3 , an oligomer suitable for photocurable inkjet inks, prepared from the following raw materials: trisphenolyl methane triglycidyl ether, acrylic acid, 1,8-naphthalene dicarboxylic anhydride, dicyclopentadiene, and synthetic auxiliary materials .

[0039] Synthetic auxiliary raw materials specifically include the following materials: hydroquinone, triphenylphosphine, trifluoromethanesulfonic acid, p-hydroxyanisole and ACMO monomer.

[0040] A method for preparing an oligomer suitable for light-curing inkjet inks, comprising the following steps:

[0041] S1: First add 460g of trisphenolyl methane triglycidyl ether, 0.6g of hydroquinone, and 3g of catalyst triphenylphosphine into a two-necked flask, then install a stirrer and a heating device, stir and heat to 85°C, and wait for the resin After liquefaction, slowly pour in 216g of acrylic acid while stirring, heat to 105°C and keep the temperature constant, and pass through protective gas for protecti...

Embodiment 2

[0048] An oligomer suitable for photocurable inkjet inks, mainly prepared from the following raw materials: trisphenolyl methane triglycidyl ether, acrylic acid, 1,8-naphthalene dicarboxylic anhydride, dicyclopentadiene and synthetic auxiliary materials Specifically, the following materials are included: hydroquinone, triphenylphosphine, trifluoromethanesulfonic acid, p-hydroxyanisole and ACMO monomer.

[0049] Synthetic auxiliary raw materials specifically include the following materials: hydroquinone, triphenylphosphine, trifluoromethanesulfonic acid, p-hydroxyanisole and ACMO monomer.

[0050] A method for preparing an oligomer suitable for light-curing inkjet inks, comprising the following steps:

[0051] S1: First add 460g of trisphenolyl methane triglycidyl ether, 0.6g of hydroquinone, and 3g of catalyst triphenylphosphine into a two-necked flask, then install a stirrer and a heating device, stir and heat to 85°C, and wait for the resin After liquefaction, pour 72g of a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an oligomer suitable for light-cured ink-jet ink and a preparation method of the oligomer, and belongs to the technical field of light-cured resin materials. The oligomer suitable for the photocuring ink-jet ink is mainly prepared from the following raw materials: triphenol methane triglycidyl ether, acrylic acid, 1,8-naphthalic anhydride, dicyclopentadiene and a synthetic auxiliary material; wherein the synthetic auxiliary material specifically comprises the following raw materials: hydroquinone, triphenyl phosphine, trifluoromethanesulfonic acid, p-hydroxyanisole and an ACMO monomer. The invention can effectively solve the problems that ink printing is unstable due to insufficient cohesion of low-molecular-weight UV resin in formula application of the UV ink and plug and unsmooth printing are caused due to poor compatibility and fluidity of high-molecular-weight UV resin.

Description

technical field [0001] The invention relates to the technical field of photocurable resin materials, in particular to an oligomer suitable for photocurable inkjet ink and a preparation method thereof. Background technique [0002] UV inkjet printing is a new technology developed at the end of the 20th century. It combines the advantages of inkjet printing technology and ultraviolet curing technology. Advantages in efficiency and physical properties. As one of the fastest-growing technologies in the field of UV technology, UV inkjet printing has made remarkable achievements in recent years, and its output value has increased from $3.9 billion in 2008 to $6.7 billion in 2012, and is expected to grow in 2018 to $15.9 billion. [0003] At present, the most widely used field is large-format printing, especially outdoor advertisements and road signs are very suitable for using UV platform inkjet printing technology. In addition, UV inkjet technology has also been rapidly promot...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C07C67/26C07C69/54C07C67/08C07C69/76C07C67/04C07C67/313C09D11/30
CPCC07C67/26C07C69/54C07C67/08C07C69/76C07C67/04C07C67/313C09D11/30C07C2603/66
Inventor 倪志平
Owner 珠海君奥新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com