Forming mode of nano-silver coating on stem cell culture dish under assistance of magnetron sputtering and chemical gradient sedimentation
A technology of stem cell culture and magnetron sputtering, applied in the direction of sputtering plating, devices for coating liquid on the surface, ion implantation plating, etc., can solve the problem of not being able to effectively promote the repair and regeneration of damaged cells in wound healing Effectively activate and promote the growth of damaged tissue cells, and cannot effectively protect from being eroded by external microorganisms, etc., to achieve a strong antibacterial isolation effect, a strong antibacterial shielding effect, and the effect of promoting wound healing
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Embodiment 1
[0056] Stem cell culture dish made of polyethylene oxide PEO material, sterilized, cleaned by high-frequency oscillation, put the stem cell culture dish as the base material into the silver target, and wrap 860 turns of copper wire with a diameter of 0.1 cm on the outer target outside the vacuum chamber by magnetron sputtering. Clean the vacuum chamber, place the base material (stem cell culture dish) on the inner target, and close the vacuum chamber. Start to evacuate the vacuum chamber, the vacuum degree is 10 -6 , and input nitrogen filling into the vacuum chamber, control the voltage 220V, and the current value is 4A, and make the inner target form a silver nanofilm on the surface of the base material (stem cell culture dish) by magnetron sputtering, and use the silver target to bombard the base material stem cells The petri dish is bombarded for 20 minutes, the silver target is closed and cooled naturally for 20 minutes, and then the silver target is opened to bombard the...
Embodiment 2
[0058] Stem cell culture dish made of polyethylene oxide PEO material, sterilized, cleaned by high-frequency oscillation, put the stem cell culture dish as the base material into the silver target, and wrap 860 turns of copper wire with a diameter of 0.1 cm on the outer target outside the vacuum chamber by magnetron sputtering. Clean the vacuum chamber, place the base material (stem cell culture dish) on the inner target, and close the vacuum chamber. Start to evacuate the vacuum chamber, the vacuum degree is 10 -6 , and input nitrogen filling into the vacuum chamber, control the voltage 220V, and the current value is 4A, and make the inner target form a silver nanofilm on the surface of the base material (stem cell culture dish) by magnetron sputtering, and use the silver target to bombard the base material stem cells The petri dish was bombarded for 17 minutes, and the silver target was closed to cool naturally for 28 minutes. Then open the silver target and bombard the bas...
Embodiment 3
[0060] The PEO-like polymer stem cell culture dish is sterilized and cleaned by high-frequency oscillation, and the stem cell culture dish is placed into the silver target. Through electromagnetic sputtering, bombard the target silver target, wind 860 turns of copper wire with a diameter of 0.1 cm on the outer target outside the magnetron sputtering vacuum chamber, clean the vacuum chamber, and place the base material (stem cell culture dish) on the inner target, Close the vacuum chamber. Start to evacuate the vacuum chamber, the vacuum degree is 10 -6 , and fill the vacuum chamber with helium, control the voltage 220V, and the current value is 4A, and make the inner target form a silver nanofilm on the surface of the base material (stem cell culture dish) by magnetron sputtering, and use the silver target to bombard the base material 20min, turn off the silver target and let it cool naturally for 20min. Then open the silver target and bombard the base material (stem cell cu...
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