Monocrystalline silicon wafer texturing agent and texturing method

A single-crystal silicon wafer, texturing agent technology, applied in chemical instruments and methods, crystal growth, final product manufacturing, etc., to reduce costs, reduce cleaning steps, and ensure the effect of texturing.

Active Publication Date: 2021-04-27
江苏启威星装备科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] Aiming at the problems of economy, environmental protection and safety of various conventional liquid additives used in the process of making texturing of monocrystalline silicon wafers, the present invention designs a simple, environmentally friendly, efficient and reusable method of making texturing of monocrystalline silicon wafers Agent and Texturing Method

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  • Monocrystalline silicon wafer texturing agent and texturing method
  • Monocrystalline silicon wafer texturing agent and texturing method

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Embodiment 1

[0038] This embodiment provides a monocrystalline silicon wafer texturing agent. In this embodiment, the monocrystalline silicon wafer texturing agent includes lye, and micron particles with kinetic energy are distributed in the lye, and the micron particles are high in fluorine At least one of molecules, alkali-resistant organic polymers, inorganic non-metals, and metal materials.

[0039] When the micron particles use fluorine-containing polymer materials, the fluorine-containing polymer is polytetrafluoroethylene, ethylene-tetrafluoroethylene copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-perfluoroether copolymer one or more. Fluorine-containing polymers are non-toxic, non-volatile, excellent in acid and alkali corrosion resistance, hardly cause loss in lye, safe and environmentally friendly, and can be used repeatedly for a long time, which can greatly reduce the cost of texturing of monocrystalline silicon wafers. cost of the drug. At ...

Embodiment 2

[0049] During the preparation of the textured surface, the size and density of hydrogen bubbles and the adhesion time on the surface of the single crystal silicon wafer will directly affect the morphology, size and uniformity of the textured surface on the surface of the single crystal silicon wafer, which in turn will affect the quality of the monocrystalline silicon wafer. The anti-reflection effect of the surface and the matching status with other coating layers. Based on the above factors, the present invention also provides a method for making texture of a single crystal silicon wafer, which uses the above-mentioned single crystal silicon wafer texturing agent to texture the surface of the single crystal silicon wafer.

[0050] Such as figure 1 as shown, figure 1 It is a flow chart of the monocrystalline silicon wafer texturing method of this embodiment, and the monocrystalline silicon wafer texturing method comprises the following steps:

[0051] S1. Arrange the lye 2 ...

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Abstract

The invention provides a monocrystalline silicon wafer texturing agent. The monocrystalline silicon wafer texturing agent comprises alkali liquor, micron particles with kinetic energy are distributed in the alkali liquor, and the micron particles are at least one of fluorine-containing macromolecules, alkali corrosion resistant organic macromolecules, inorganic nonmetal and metal materials. The invention also provides a monocrystalline silicon wafer texturing method, which comprises the following steps of: preparing the monocrystalline silicon wafer texturing agent, namely preparing alkali liquor, adding the micro-particles to prepare a mixed solution, obtaining the kinetic energy of the micro-particles in the mixed solution, and putting a monocrystalline silicon wafer into the monocrystalline silicon wafer texturing agent for texturing at a third temperature within a time t. According to the monocrystalline silicon wafer texturing agent and the texturing method provided by the invention, parameters such as the size and the density of hydrogen bubbles and the adhesion time of the hydrogen bubbles on the surface of the monocrystalline silicon wafer can be influenced, and the morphology, the size and the uniformity of a prepared textured surface can be directly influenced, so that the anti-reflection effect of the surface of the monocrystalline silicon wafer and the matching condition between the textured surface and other film layers are influenced, and the texturing agent has the advantages of greenness, environment-friendliness and low cost.

Description

technical field [0001] The invention relates to the technical field of solar cell manufacturing, in particular to a texturing agent and a texturing method for monocrystalline silicon wafers. Background technique [0002] In the production process, in order to prepare high-efficiency monocrystalline silicon solar cells, it is necessary to make a textured surface on the surface of the silicon wafer to minimize the optical loss caused by the reflection of incident light on the surface of the crystalline silicon. At present, the "pyramid" textured surface structure with anti-reflection effect is mostly prepared according to the anisotropic corrosion characteristics of the low-concentration alkaline solution on the surface of the silicon wafer. The principle of the suede on the surface of monocrystalline silicon solar cells is: through the chemical corrosion of the alkaline solution and the surface of the silicon wafer, the hydrogen bubbles enriched on the surface of the monocrys...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10H01L31/18
CPCC30B33/10H01L31/18Y02P70/50
Inventor 不公告发明人
Owner 江苏启威星装备科技有限公司
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