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Pulse plasma generation system based on direct-current power supply

A technology of pulsed plasma and generation system, which is applied in the field of ion generation devices, can solve the problems of difficult generation of pulsed plasma and the like, and achieves the effect of simple structure

Active Publication Date: 2021-04-20
HEBEI UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a pulsed plasma generation system based on DC power supply to solve the problem that pulsed plasma is difficult to generate under DC power supply

Method used

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  • Pulse plasma generation system based on direct-current power supply
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  • Pulse plasma generation system based on direct-current power supply

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Embodiment Construction

[0020] Such as figure 1 As shown, the pulsed plasma generation system of the present invention includes a vacuum chamber 3 , a DC power supply 1 , a photomultiplier tube 7 , an oscilloscope 8 and other parts. Among them, the vacuum chamber 3 is a closed shell-shaped body in a vacuum state, and is externally connected with a capacitive film type absolute pressure transmitter 18, and is equipped with a cathode stainless steel needle 5 and an anode molybdenum sheet 6 as needle plate discharge electrodes, and the cathode stainless steel needle 5 and the anode The upper and lower positions of the molybdenum sheet 6 are opposite, and two observation windows 4 opposite to each other are arranged on the side wall of the vacuum chamber 3 for observing the plasma generation process. The negative pole of the DC power supply 1 is electrically connected to the cathode stainless steel needle 5 through the current limiting resistor 2 , the positive pole of the DC power supply 1 is grounded o...

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Abstract

The invention relates to a pulse plasma generation system based on a direct-current power supply, which structurally comprises a vacuum chamber, the direct-current power supply, a photomultiplier and an oscilloscope, a capacitance film type absolute pressure transmitter is externally connected with the vacuum chamber, a cathode stainless steel needle and an anode molybdenum plate are arranged in the vacuum chamber, and two observation windows which are opposite in position are arranged on the side wall of the vacuum chamber; the oscilloscope is connected with two voltage signal probes, one voltage signal probe is electrically connected with the cathode stainless steel needle, and the other voltage signal probe is electrically connected with the anode molybdenum plate and is used for displaying voltage waveforms applied to the cathode stainless steel needle and the anode molybdenum plate and carrying out qualitative and quantitative analysis on the pulse plasma generated in the vacuum chamber. The input power supply is simple in structure, and stable pulse plasma can be generated in the needle plate discharge space under the condition that the input end is the direct-current power supply by controlling the change of an experimental circuit and related environmental parameters.

Description

technical field [0001] The invention relates to a gas discharge plasma generating device, in particular to a pulse plasma generating system based on a DC power supply. Background technique [0002] With the in-depth development of gas discharge in the field of plasma generation, gas discharge plasma technology has played an increasingly important role in the fields of spectral analysis, surface treatment, material preparation, and environmental governance. The plasma, the way to artificially generate plasma is mainly through gas discharge, even if the gas is ionized. Therefore, as an emerging field in scientific research, the generation of plasma has always been a hot spot studied by scholars from various countries. [0003] Plasma has high energy activity. In recent years, with the emergence of pulsed plasma, gas discharge plasma technology has gradually been applied to various fields of human production and life. During the generation of pulsed plasma, there will be no ir...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
Inventor 何寿杰赵建勋李金浩包慧玲李庆
Owner HEBEI UNIVERSITY
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