Ion induction basis material
A matrix material, ion induction technology, applied in application, powder coating, artificial respiration, etc., to achieve the effect of charge stabilization, reduction of thermal effect, and reduction of electrical conductivity
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Embodiment 1
[0024] An ion-sensing base material, comprising a backing layer, an adhesive layer, an ion accumulation layer, a surface covering layer and a peeling layer, the adhesive layer is placed between the backing layer and the ion accumulation layer, and the ion is placed in the middle of the adhesive layer. The accumulation layer, the surface covering layer is between the ion accumulation layer and the peeling layer, and the peeling layer is the outermost layer. The surface covering layer can completely cover the ion accumulation layer, and the peeling layer is an oily surface support paper layer, and the peeling layer can completely cover the surface covering layer, and is completely consistent with the size and size of the backing layer and the adhesive layer. same.
[0025] The ion stacking layer is prepared by corona charging of polytetrafluoroethylene film doped with silicon dioxide, and its electret voltage range is 20KV for the positive electrode of the electret voltage, 20KV...
Embodiment 2
[0035] An ion-sensing base material, comprising a backing layer, an adhesive layer, an ion accumulation layer, a surface covering layer and a peeling layer, the adhesive layer is placed between the backing layer and the ion accumulation layer, and the ion is placed in the middle of the adhesive layer. The accumulation layer, the surface covering layer is between the ion accumulation layer and the peeling layer, and the peeling layer is the outermost layer. The surface covering layer can completely cover the ion accumulation layer, and the peeling layer is an oily surface support paper layer, and the peeling layer can completely cover the surface covering layer, and is completely consistent with the size and size of the backing layer and the adhesive layer. same.
[0036] The ion stacking layer is prepared by corona charging of polytetrafluoroethylene film doped with silicon dioxide, and its electret voltage range is 25KV for the positive electrode of the electret voltage, 10KV...
Embodiment 3
[0046] An ion-sensing base material, comprising a backing layer, an adhesive layer, an ion accumulation layer, a surface covering layer and a peeling layer, the adhesive layer is placed between the backing layer and the ion accumulation layer, and the ion is placed in the middle of the adhesive layer. The accumulation layer, the surface covering layer is between the ion accumulation layer and the peeling layer, and the peeling layer is the outermost layer. The surface covering layer can completely cover the ion accumulation layer, and the peeling layer is an oily surface support paper layer, and the peeling layer can completely cover the surface covering layer, and is completely consistent with the size and size of the backing layer and the adhesive layer. same.
[0047] The ion stacking layer is prepared by corona charging of silicon dioxide-doped and modified polytetrafluoroethylene film. The electret voltage range is 30KV for the positive electrode, 25KV for the negative el...
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