Circuit board production equipment based on vacuum etching technology

Abstract

The invention relates to the field of etching technology, and discloses circuit board production equipment based on vacuum etching technology, which includes a base, a clamping plate, an etching cylinder, a rotating motor, a turntable, a vacuum device and an etching device. The bottom surface of the etching cylinder is in a hollow state, and the clamping plate It is an inverted L-shaped body. The number of clamping plates is two and they are opposite to each other. The side of the two clamping plates facing away from each other is curved and matches the inner wall of the etching barrel. The vacuum device and the etching device are both installed on the etching barrel. , through the setting of the vacuum device, the continuous air extraction effect is used to form a vacuum effect in all the bases, so as to perform a strong extraction effect on the dust in the base, thereby removing the dust in the base or circuit board before etching, and etching The smoke and impurities generated by the chemical reaction during the process increase the cleanliness of the circuit board after the etching is completed, and avoid the problem of reduced quality of the circuit board caused by dust and other smoke and impurities participating in the etching process. Compared with the cleaning mechanism on the existing etching machine , the cleaning scope is more comprehensive and the intensity is stronger.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to circuit board production equipment based on vacuum etching technology. Background technique [0002] Existing etching machines for circuit boards mostly use the method of spraying chemical solutions to etch the exposed metal parts, so as to obtain the required geometric patterns and high-precision dimensions. [0003] The existing patent No. CN102092955A proposes an etching device, which has the advantage of reducing the occurrence of etching defects, but it lacks the effect of effectively cleaning the etching environment and impurities on the circuit board and effectively recovering the etching solution before and during etching. This leads to the reduction of the etching effect of the circuit board and the reduction of the efficiency of the front and rear processing. [0004] The existing patent No. CN103208438A proposes an etching device, which has the advantages of saving co...

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Problems solved by technology

[0003] The existing patent No. CN102092955A proposes an etching device, which has the advantage of reducing the occurrence of etching defects, but it lacks the effect of effectively cleaning the etching environment and impurities on the circuit board and effectively recovering the etching solution before and during etching. The problem that the etching effect of the circuit board is reduced and the efficiency of the front and rear processing is reduced

[0004] The existing patent No. CN103208438A proposes an etching device, which has the advantages of saving costs, shortening the manufacturing process time and increasing production capacity, but it uses various electrical components such as vacuum pumps, pneumatic cylinders and conveying components, so that it has high Equipment cost and power consumption, as well as high equipment volume, and the above conditions make the use conditions of the equipment lead to the problem of high requirements for the use environment

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