Etching device
A technology for etching devices and chambers, which is applied in the manufacture of discharge tubes, electrical components, semiconductors/solid-state devices, etc., can solve problems such as etching residues, and achieve the effect of real-time temperature control
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[0028] In order to make the purpose, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings, please refer to the drawings in the accompanying drawings, wherein the same component symbols represent the same components, the following description is Based on the particular embodiment of the invention shown, it should not be construed as limiting the invention to other embodiments not detailed herein. The word "embodiment" as used in this specification means an example, instance or illustration.
[0029] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the ...
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