MoS2 phototransistor capable of improving photoelectric detection performance and manufacturingmethod thereof
A phototransistor and photodetection technology, applied in the field of photodetection, can solve the problems of high cost and cumbersome preparation methods, achieve the effects of alleviating photoresponsivity and photoresponse speed, improving photoresponsivity, and breaking through technical barriers
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[0038] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.
[0039] like figure 1 As shown, a MoS with improved photodetection performance 2 A phototransistor comprising: Si / SiO 2 Substrate, bilayer MoS 2 Thin films, Pt electrodes, InP@ZnS quantum dots and silver films; multiple sheets of the bilayer MoS 2 The film is randomly arranged on the Si / SiO 2 The upper surface of the substrate; wherein the bilayer MoS 2 The film has a triangular structure. The Pt electrode is fabricated on the bilayer MoS 2 Thin films and Si / SiO 2 The upper surface of the substrate is used as the drain source electrode; the Pt electrode is an interdigitated electrode with a thickness of 50nm and a width of 2 μm to realize the surface plasmon effect; the finger length of the Pt electrode is 300 μm, and the wide distance between the two electrodes is 5 μm ; this bridge-like MoS 2 They are connected together under differe...
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