Manufacturing method of multi-layer heat dissipation structure-based three-dimensional radio frequency module
A technology of radio frequency module and heat dissipation structure, applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, semiconductor devices, etc., can solve the problems of reducing heat dissipation capacity, affecting chip reliability, and inconsistent chip surface heat dissipation capacity, etc. To achieve the same effect of heat dissipation
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Embodiment 1
[0033] Such as Figure 1 to Figure 3 As shown, a method for manufacturing a three-dimensional radio frequency module based on a multi-layer heat dissipation structure specifically includes the following steps:
[0034] 101) Fabrication steps of adapter plate 101: fabricate microchannel grooves 103 and TSV holes 102 on the upper surface of adapter plate 101 by photolithography, dry or wet etching process, and the depth range of microchannel grooves 103 is 10um TSV hole 102 has a diameter ranging from 1um to 1000um and a depth ranging from 10um to 1000um. The microchannel grooves 103 are arranged on both sides of the TSV hole 102 . Silicon oxide or silicon nitride is deposited on the upper surface of the adapter plate 101 , or an insulating layer is formed by direct thermal oxidation, and the thickness of the insulating layer ranges from 10 nm to 100 um. The seed layer is made on the insulating layer by physical sputtering, magnetron sputtering or evaporation process; the thic...
Embodiment 2
[0043] Such as Figure 4 to Figure 6 As shown, the difference from Embodiment 1 is that the TSV holes 102 are arranged on both sides of the micro-channel groove 103, and only the TSV holes 102 of the bottom plate are connected to each other. The TSV hole 102 is filled with a heat conducting medium 105 . A power chip 104 is soldered on the TSV hole 102 .
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