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A cross-scale three-dimensional laser direct writing processing device

A three-dimensional laser and processing device technology, used in additive processing, metal processing equipment, laser welding equipment, etc., can solve problems such as poor mechanical strength, damage to target structures, and low degree of structural polymerization, so as to improve processing efficiency and ensure processing. Accuracy, the effect of extending the range of action

Active Publication Date: 2021-07-27
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

When the laser energy is too low or the exposure time is short, the polymerization reaction is insufficient, the structure polymerization degree is low, and the mechanical strength is poor; when the laser energy is too high or the exposure time is too long, the thermal effect generated by the laser will damage the target structure formed by polymerization
Therefore, the adjustment range that can be achieved by the method of laser energy and exposure time is limited

Method used

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  • A cross-scale three-dimensional laser direct writing processing device
  • A cross-scale three-dimensional laser direct writing processing device

Examples

Experimental program
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Effect test

Embodiment 1

[0024] Such as figure 1 , the converging light unit 1, suppressing light unit 2, processing unit 3, and monitoring unit 4 of the three-dimensional laser direct writing processing device are all connected to the system control unit 5, and the converging light of the converging light unit 1 and the suppressing light of the suppressing light unit 2 enter the processing Unit 3.

[0025] Such as figure 2 , on the optical platform, place the polymerization laser 101, the light intensity modulator one 102, the lens combination one 103 and the half mirror two 104 in sequence along the straight line direction, and the incident light direction of the half mirror two 104 is related to the device The placement directions are consistent, and the outgoing light is coupled into the focusing objective lens 301 . Suppression laser 201, light intensity modulator 2 202, beam profile controller 203, lens combination 2 204, half mirror 3 205 are placed on the optical platform in sequence along ...

Embodiment 2

[0028] The differences between this example and Example 1 are as follows, and the rest are the same: the initiator and inhibitor are photoluminescent materials such as isopropylthioxanthone, and the wavelength of the polymerization absorption peak is 380 nm. The absorption peak wavelength is suppressed at 440 nm. The wavelength of the illumination source is 605 nm. The output light wavelength of the laser 101 for polymerization is 800 nm. The output light wavelength of the suppressing laser 201 is 532 nm. Light intensity modulator 1 102 is a commercial acousto-optic modulator, light intensity modulator 2 202 is a commercial acousto-optic modulator, and beam profile controller 203 is a digital micromirror device. The focusing lens 301 is a water immersion objective lens.

Embodiment 3

[0030] The differences between this example and Example 1 are as follows, and the rest are the same: the initiator is 2,5-bis(p-dimethylaminooctivalerolactone)-cyclopentanone, and the absorption peak wavelength is 511 nm. The inhibitor is the photoinactivation material tetraethylthiuram disulfide, and the absorption peak wavelength is 375 nm. The wavelength of the illumination source is 535 nm. The output light wavelength of the laser 101 for polymerization is 800 nm. The output light wavelength of the suppressing laser 201 is 375 nm. The light intensity modulator 1 102 is a combined device of a half-wave plate and a Glan galvanometer, the light intensity modulator 2 202 is a combined device of a half-wave plate and a Glan galvanometer, and the beam profile controller 203 is a spatial light modulation. The focusing lens 301 is a dry objective lens.

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Abstract

The invention discloses a cross-scale three-dimensional laser direct writing processing device, which includes a converging light unit, a suppressing light unit, a processing unit, a monitoring unit and a system control unit, and the converging light of the converging light unit and the inhibiting light of the suppressing light unit enter the processing unit , the monitoring unit includes an illumination source, a half-mirror 1 and a camera, the illumination source is located in the transmission direction of the half-mirror 1, the camera is located in the reflection direction of the half-mirror 1, the converging light unit, the suppressing light unit, the processing The unit and the monitoring unit are connected with the system control unit. The invention realizes cross-scale three-dimensional laser direct writing processing based on two-photon polymerization laser direct writing, and realizes processing accuracy covering micron to nanometer scales; by introducing photoinhibition reactions to adjust the size of effective polymeric elements, it breaks through the diffraction limit of the focusing lens , it is possible to use a focusing objective lens with a small numerical aperture to achieve high-precision processing.

Description

technical field [0001] The invention relates to an additive manufacturing device, in particular to a cross-scale three-dimensional laser direct writing processing device. Background technique [0002] The laser direct writing technology based on two-photon polymerization uses the nonlinear optical interaction between femtosecond laser and matter to confine the polymerization reaction to a tiny area of ​​the laser focus. Using the spatial confinement effect of two-photon polymerization, combined with the relative movement of the laser focus and the target material, the direct writing preparation of complex structures can be realized in three-dimensional space. Therefore, two-photon polymerization can meet high-precision three-dimensional direct writing processing, and has broad application prospects in the fields of micro-nano optical devices, microelectronic systems, microfluidic channels, and cell culture scaffolds. [0003] According to the diffraction limit, the size of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/00B33Y30/00
CPCB23K26/00B33Y30/00
Inventor 顾忠泽丁海波顾洪成刘柯良
Owner SOUTHEAST UNIV
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