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Method for achieving even pattern array during ink-jet printing

An inkjet printing and uniform pattern technology, applied in the field of inkjet printing, can solve the problems of limited application and achieve good repeatability

Active Publication Date: 2019-12-27
SOUTH CHINA UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the limitation of the accuracy of the instrument, the minimum line width that can be achieved by the conventional piezoelectric inkjet printing technology is about 20 μm, which limits its application in printing high-definition, large-area uniform arrays

Method used

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  • Method for achieving even pattern array during ink-jet printing
  • Method for achieving even pattern array during ink-jet printing
  • Method for achieving even pattern array during ink-jet printing

Examples

Experimental program
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Embodiment

[0023] (1) At room temperature, clean the glass substrate sequentially with tetrahydrofuran, isopropanol, lotion, deionized water (twice), and ultrasonic cleaning in isopropanol. The cleaning time of each step is 10 minutes, and then place the cleaned glass substrate on Dry in a constant temperature oven at 75°C. Then the glass substrate was treated with oxygen Plasma for 10 min at room temperature to remove surface impurities and increase the surface energy of the substrate.

[0024] (2) Spin-coat one deck of PVP solution (500mg PVP powder+0.1ml methylated polymelamine co-formaldehyde in 5ml ethylene glycol solution to obtain 100mg / ml PVP solution on the treated glass substrate with a homogenizer at room temperature. solution), the spin-coating conditions are: the rotation speed is 3000 rpm, and the time is 30s. After the spin coating, the sample was cured with a UV curing machine for 3 minutes to obtain a PVP polymer film.

[0025] (3) A Dimatix 2800 series piezoelectric i...

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Abstract

The invention belongs to the technical field of ink-jet printing and discloses a method for achieving an even pattern array during ink-jet printing. The method comprises the steps that a glass substrate is pretreated and then rotatably coated with a layer of polymer solution, and through ultraviolet curing, a polymer thin film is obtained; the polymer thin film and a solvent of ink for ink-jet printing in the later period are dissolved in each other; the ink for ink-jet printing is used for ink-jet printing on the polymer thin film to form an even ink droplet array, and annealing and natural cooling are conducted to obtain the even pattern array. According to the method, a layer of polymer thin film is prepared before ink-jet printing in advance, by using the coffee ring effect in the ink-jet printing process, the high-precision even pattern array can be obtained, the limit of a traditional preparation method is broken through, and the obtained pattern array has good repeatability andhomogeneity.

Description

technical field [0001] The invention belongs to the technical field of inkjet printing, and in particular relates to a method for realizing uniform pattern array of inkjet printing. Background technique [0002] Inkjet Printing (Inkjet Printing) is a bottom-up additive manufacturing graphics technology, which has the advantages of no vacuum, direct graphics, low temperature, low cost, and environmental friendliness. It is widely used in the preparation of thin-film electronic devices such as capacitors, thin-film transistors, organic light-emitting diodes, and organic solar cells. [0003] In the inkjet printing process, the final shape of the droplet on the printed substrate is the result of the joint action of various factors such as the evaporation of the droplet, the surface tension of the droplet, and the surface energy of the substrate. Ink droplets are usually deposited on the surface of the substrate in a spherical shape. Due to their special geometric structure, th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41M5/00
CPCB41M5/0047B41M5/0064
Inventor 宁洪龙陈建秋姚日晖梁宏富张观广张旭梁志豪邱斌黎群杰彭俊彪
Owner SOUTH CHINA UNIV OF TECH
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