Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multi-quantum well structure, photoelectric device epitaxial wafer and photoelectric device

A multi-quantum well structure, optoelectronic device technology, applied in electrical components, semiconductor devices, circuits, etc., can solve the problem of low internal quantum efficiency, external quantum efficiency and luminous efficiency of devices, internal quantum efficiency luminous efficiency, low electro-optical conversion efficiency, and luminescence. The problem of low electro-optical conversion efficiency of diodes can improve the optical recombination efficiency, enhance the localization effect, and improve the internal quantum efficiency.

Active Publication Date: 2019-12-13
UNIV OF SCI & TECH OF CHINA
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Existing AlGaN-based UVLEDs often use a multi-quantum well structure with uniform composition and flat structure as the active region of the device (ie, the light-emitting region or the electron-hole recombination region), and the photon recombination efficiency of carriers in the two-dimensional quantum well structure Low, resulting in low internal quantum efficiency, external quantum efficiency and luminous efficiency of the device, and low electro-optical conversion efficiency of light-emitting diodes
Similar to light-emitting diodes, other optoelectronic devices such as light-emitting lasers and light-emitting detectors have problems with low internal quantum efficiency, external quantum efficiency, luminous efficiency, and low electro-optic conversion efficiency.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-quantum well structure, photoelectric device epitaxial wafer and photoelectric device
  • Multi-quantum well structure, photoelectric device epitaxial wafer and photoelectric device
  • Multi-quantum well structure, photoelectric device epitaxial wafer and photoelectric device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] In order to make the purpose, technical solutions and advantages of the present disclosure clearer, the present disclosure will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0027] figure 1 A schematic diagram of the structure of the multi-quantum well structure provided by the embodiment of the present disclosure is schematically shown. refer to figure 1 , combined with Figure 2A and 2B , to describe the multi-quantum well structure of the present disclosure in detail.

[0028] The multi-quantum well structure is composed of alternately grown quantum well layers and quantum barrier layers, and each quantum well layer and quantum barrier layer is an uneven structure. The uneven structure is, for example, a wavy structure with the same thickness, or other structures with different thicknesses, or an asymmetric triangular wavy line structure.

[0029] Preferably, the included angle be...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a multi-quantum well structure, a photoelectric device epitaxial wafer and a photoelectric device. The multi-quantum well structure is composed of quantum well layers and quantum barrier layers which grow alternately, and each quantum well layer and each quantum barrier layer are of an uneven structure. The quantum well layer and the quantum barrier layer of the multi-quantum well structure are arranged to be of structures with uneven components and uneven structures. The photorecombination efficiency, the internal quantum efficiency and the luminous efficiency of carriers are improved, and when the structure is applied to a photoelectric device epitaxial wafer and a photoelectric device, preparation of a high-power light-emitting diode, a high-power light-emittinglaser and a high-power light-emitting detector device is realized.

Description

technical field [0001] The disclosure relates to the technical field of semiconductors, in particular to a multi-quantum well structure, an optoelectronic device epitaxial wafer and a photoelectric device. Background technique [0002] Ultraviolet Light Emitting Diode (UVLED) is mostly made of third-generation semiconductor materials. InAlGaN or BAlGaN materials have the characteristics of wide band gap and direct band gap. InAlGaN Or BAlGaN-based UVLEDs have broad application prospects in the fields of sterilization, disinfection, medical treatment and non-line-of-sight optical communication. AlGaN-based UV LEDs can achieve continuously adjustable emission wavelengths in the range of 200nm-360nm, and can be mass-produced on cheap silicon, sapphire, gallium nitride, aluminum nitride and silicon carbide substrates by heteroepitaxial methods. [0003] Existing AlGaN-based UVLEDs often use a multi-quantum well structure with uniform composition and flat structure as the active...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/06H01L33/24H01L33/32
CPCH01L33/06H01L33/325H01L33/24
Inventor 孙海定龙世兵
Owner UNIV OF SCI & TECH OF CHINA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products