Temperature control method of Czochralski monocrystalline silicon
A temperature control method, Czochralski silicon technology, applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., can solve the problems of temperature control system lag, unstable diameter control, inaccurate SP value, etc., and achieve reduction The effect of reducing equipment cost, eliminating unstable factors, and improving the degree of automation
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[0023] The invention discloses a temperature control method for Czochralski silicon single crystal, which is used for automatic temperature adjustment in the equal-diameter growth process of silicon single crystal, comprising the steps of: determining the average crystal growth rate V; setting the target crystal growth rate V S , calculate the average crystal growth rate V and the target crystal growth rate V S The deviation ΔV; according to ΔV, determine the power setting value Pr and output it, and then adjust the temperature.
[0024] Further, determining the average crystal growth rate V includes the steps of: setting the target crystal growth diameter D S , measure the actual crystal growth diameter D, calculate the actual crystal growth diameter D and the target crystal growth diameter D S The deviation ΔD.
[0025] Determining the average crystal growth rate V also includes the step of: calculating the set value V of the crystal growth rate based on ΔD and using the P...
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