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Method for etching surface microstructure of polytetrafluoroethylene material by using ion beam

A technology of polytetrafluoroethylene and ion beam etching, which is applied in the direction of microstructure technology, microstructure devices, manufacturing microstructure devices, etc., can solve the problems of PTFE processing microstructure, PTFE surface processing, photoresist can not adhere, etc.

Inactive Publication Date: 2019-11-01
BEIJING JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the good non-stickiness of the PTFE surface, traditional photoresists cannot adhere to the PTFE surface, so it is impossible to process and etch microstructures on the PTFE surface by photolithography.
PTFE cannot chemically react with conventional acids and bases, so it is impossible to process microstructures on the surface of PTFE by chemical corrosion

Method used

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  • Method for etching surface microstructure of polytetrafluoroethylene material by using ion beam
  • Method for etching surface microstructure of polytetrafluoroethylene material by using ion beam
  • Method for etching surface microstructure of polytetrafluoroethylene material by using ion beam

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Effect test

Embodiment 1

[0032] Such as figure 1 As shown, Embodiment 1 of the present invention provides a method for ion beam etching the surface microstructure of polytetrafluoroethylene materials, including the following process steps:

[0033] Process the hollow pattern 2 of the array on the mask plate 1; use the mask plate 1 with the hollow pattern 2 to cover the surface of the polytetrafluoroethylene material 3, so that the hollow pattern 2 is perpendicular to the surface of the polytetrafluoroethylene material 3 Mapping, as an effective etching area; use a parallel ion beam to carry out the first vertical bombardment on the surface of the polytetrafluoroethylene material 3 covered with the mask plate 1 for a certain time, and the ion beam passes through the effective etching area to make the polytetrafluoroethylene The surface of the vinyl material forms a first surface structure 4 consistent with the pattern of the effective etching area.

[0034] The mask plate 1 is made of stainless steel....

Embodiment 2

[0038] Embodiment 2 of the present invention provides a method for ion beam etching the surface microstructure of polytetrafluoroethylene materials, including the following process steps:

[0039] An array of hollow patterns 2 is processed on the mask plate 1; two layers of mask plates 1 with the same hollow pattern are used to cover the polytetrafluoroethylene material 3 in turn, and the two layers of mask plates 1 are vertical to the polytetrafluoroethylene material. The central axis of the tetrafluoroethylene material rotates at a certain angle for the rotation axis; the overlapping area of ​​the hollow pattern between the two mask plates 1 is vertically mapped to the surface of the polytetrafluoroethylene material 3 as an effective etching area. Use the parallel ion beam to carry out the first vertical bombardment on the surface of the polytetrafluoroethylene material 3 covered with the mask plate 1 for a certain period of time, and the ion beam passes through the effective...

Embodiment 3

[0043] Such as Figure 5 As shown, implementation 3 of the present invention provides a method for ion beam etching the surface microstructure of polytetrafluoroethylene materials, including the following process steps:

[0044] Process the hollow pattern 2 of the array on the mask plate 1; use the mask plate 1 with the hollow pattern 2 to cover the surface of the polytetrafluoroethylene material 3, so that the hollow pattern 2 is perpendicular to the surface of the polytetrafluoroethylene material 3 Mapping, as an effective etching area; use a parallel ion beam to carry out the first vertical bombardment on the surface of the polytetrafluoroethylene material 3 covered with the mask plate 1 for a certain time, and the ion beam passes through the effective etching area to make the polytetrafluoroethylene The surface of the vinyl material forms a first surface structure 4 consistent with the pattern of the effective etching area; After the surface is rotated by a certain angle,...

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Abstract

The invention provides a method for etching a surface microstructure of a polytetrafluoroethylene (PTFE) material by using an ion beam, and belongs to the technical field of hydrophobic surface microstructure processing. The method comprises the following steps: processing an array hollow pattern on a mask plate; covering the surface of the polytetrafluoroethylene material with a mask plate with ahollow pattern; and vertically bombarding one surface of the polytetrafluoroethylene material covered with the mask plate for a certain time by using a parallel ion beam, wherein the ion beam penetrates through the effective etching region to form a surface structure consistent with the pattern of the effective etching region on the surface of the polytetrafluoroethylene material. According to the method, the bombardment etching effect of low-energy parallel argon ion beams on the PTFE surface is good, and the shape and the feature size of an etching pattern on the PTFE surface are controlledby controlling the covering mode and the rotating angle of the stainless steel mask plate. Through controlling the etching depth of the PTFE surface pattern by controlling the etching time of the ionbeam, a regular array microstructure can be machined on the surface of PTFE, and controllable adjustment of the hydrophobic property of the surface of PTFE is achieved.

Description

technical field [0001] The invention relates to the technical field of hydrophobic surface microstructure processing, in particular to a method for ion beam etching the surface microstructure of polytetrafluoroethylene materials. Background technique [0002] With the progress and development of science and technology, refrigeration equipment, desulfurization equipment and micro-reactors have continuously increased the demand for hydrophobic surfaces and acid and alkali corrosion resistance. The hydrophobic surface can effectively improve the surface condensation heat transfer capacity, and the droplets have better sliding and rolling effects on the hydrophobic surface. The hydrophobicity of the solid surface is determined by the inherent properties of the material and the surface microstructure. The lower the surface energy of the material, the smaller the surface microstructure, and the higher the hydrophobicity of the solid surface. Polytetrafluoroethylene (PTFE) materia...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
CPCB81C1/00563B81C2201/0132
Inventor 贾力丁艺
Owner BEIJING JIAOTONG UNIV
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